About: CHARACTERIZATION OF THE NANOSTRUCTURED NICKEL OXIDE LAYERS PREPARED BY ION BEAM SPUTTERING     Goto   Sponge   NotDistinct   Permalink

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  • Nanostructured nickel oxide layers (thickness cca 100 nm) were prepared by bombardment of nickel foil with ion beam created from a mixture of argon and oxygen. Different volume ratios of argon:oxygen mixture were used, ranging from 4:1 to 1:3. Composition of the resulting layers was analyzed by RBS, morphology by AFM and main crystal orientation of the sample by XRD. The electrophysical properties (resistivity, concentration of charge carriers) were measured by four point Van der Pauw technique and Hall measurement respectively. Prepared samples were characterized in as-deposited state and after annealing with varying temperature of treatment. Chemical composition (i.e. stoichiometry) of the as-deposited samples with different argon:oxygen ratio was related to their electrophysical parameters. Hall measurements are showing majority charge carriers to be electrons - surface concentration (0.5 - 2.3) x 1021 m-2 - suggesting prevailing metallic conductivity. Resistivity of the sample is increasing with higher amount of oxygen in gas mixture. The as-deposited layer is almost amorphous with no visible grains on AFM. Comparison of the as-deposited and annealed sample is presented. Annealing of the sample causes reorganization accentuating several crystalline orientation planes hence suggesting polycrystalline structure is formed. Annealing process also leads to significant increase of the layer transmittance.
  • Nanostructured nickel oxide layers (thickness cca 100 nm) were prepared by bombardment of nickel foil with ion beam created from a mixture of argon and oxygen. Different volume ratios of argon:oxygen mixture were used, ranging from 4:1 to 1:3. Composition of the resulting layers was analyzed by RBS, morphology by AFM and main crystal orientation of the sample by XRD. The electrophysical properties (resistivity, concentration of charge carriers) were measured by four point Van der Pauw technique and Hall measurement respectively. Prepared samples were characterized in as-deposited state and after annealing with varying temperature of treatment. Chemical composition (i.e. stoichiometry) of the as-deposited samples with different argon:oxygen ratio was related to their electrophysical parameters. Hall measurements are showing majority charge carriers to be electrons - surface concentration (0.5 - 2.3) x 1021 m-2 - suggesting prevailing metallic conductivity. Resistivity of the sample is increasing with higher amount of oxygen in gas mixture. The as-deposited layer is almost amorphous with no visible grains on AFM. Comparison of the as-deposited and annealed sample is presented. Annealing of the sample causes reorganization accentuating several crystalline orientation planes hence suggesting polycrystalline structure is formed. Annealing process also leads to significant increase of the layer transmittance. (en)
Title
  • CHARACTERIZATION OF THE NANOSTRUCTURED NICKEL OXIDE LAYERS PREPARED BY ION BEAM SPUTTERING
  • CHARACTERIZATION OF THE NANOSTRUCTURED NICKEL OXIDE LAYERS PREPARED BY ION BEAM SPUTTERING (en)
skos:prefLabel
  • CHARACTERIZATION OF THE NANOSTRUCTURED NICKEL OXIDE LAYERS PREPARED BY ION BEAM SPUTTERING
  • CHARACTERIZATION OF THE NANOSTRUCTURED NICKEL OXIDE LAYERS PREPARED BY ION BEAM SPUTTERING (en)
skos:notation
  • RIV/60461373:22340/11:43892102!RIV12-MSM-22340___
http://linked.open...avai/predkladatel
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(GAP108/11/1298), S, Z(MSM6046137306)
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 190003
http://linked.open...ai/riv/idVysledku
  • RIV/60461373:22340/11:43892102
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • Nickel oxide, Ion Beam Sputtering, Van der Pauw (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...ontrolniKodProRIV
  • [D3F62831CEA2]
http://linked.open...v/mistoKonaniAkce
  • Brno
http://linked.open...i/riv/mistoVydani
  • Ostrava
http://linked.open...i/riv/nazevZdroje
  • NANOCON 2011
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...iv/tvurceVysledku
  • BEJŠOVEC, Václav
  • Horák, Pavel
  • Khun, Josef
  • LAVRENTIEV, Vasyl
  • Vrňata, Martin
http://linked.open...vavai/riv/typAkce
http://linked.open.../riv/zahajeniAkce
http://linked.open...n/vavai/riv/zamer
number of pages
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  • TANGER
https://schema.org/isbn
  • 978-80-87294-23-9
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  • 22340
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