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  • The NiO and TiO2 films were deposited by DC reactive magnetron sputtering from Ni and Ti targets on two types of substrates: Si and alumina. The microstructure and the composition of the films were analyzed using X-ray diffraction with Cu K alpha radiation in Bragg-Brentano geometry and grazing incident diffraction geometry. Surface topography of the films was examined by atomic force microscopy using a Topometrix Discover TM 2000 under normal air conditions. Films were tested in the presence of H2 andethylalcohol for their possible use in sensor applications.
  • The NiO and TiO2 films were deposited by DC reactive magnetron sputtering from Ni and Ti targets on two types of substrates: Si and alumina. The microstructure and the composition of the films were analyzed using X-ray diffraction with Cu K alpha radiation in Bragg-Brentano geometry and grazing incident diffraction geometry. Surface topography of the films was examined by atomic force microscopy using a Topometrix Discover TM 2000 under normal air conditions. Films were tested in the presence of H2 andethylalcohol for their possible use in sensor applications. (en)
Title
  • Physical and Gas Sensing Properties of NiO and TiO2 Films
  • Physical and Gas Sensing Properties of NiO and TiO2 Films (en)
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  • Physical and Gas Sensing Properties of NiO and TiO2 Films
  • Physical and Gas Sensing Properties of NiO and TiO2 Films (en)
skos:notation
  • RIV/60461373:22340/02:00007030!RIV/2004/MSM/223404/N
http://linked.open.../vavai/riv/strany
  • 66;68
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  • Z(MSM 223400007)
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  • 658256
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  • RIV/60461373:22340/02:00007030
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  • thin films, gas detection; nickel oxide; sputtering; titanium dioxide (en)
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  • [BAFE8B7B9276]
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  • Bratislava
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  • Bratislava
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  • 5th Scientific Conference on Electrical Engineering and Information Technology
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  • Kremer, J.
  • Spiess, L.
  • Hotový, I.
  • Široký, Karel
  • Schawohl, J.
  • Řeháček, Ř.
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http://linked.open.../riv/zahajeniAkce
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number of pages
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  • Slovenská technická univerzita v Bratislave
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  • 22340
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