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  • In this contribution we present a growth of Ga1-xMnxN layers by MOVPE. Mn doped GaN layers were grown with and without undoped GaN templates on (0001) sapphire substrates in a quartz horizontal reactor. For the deposition of Ga1-xMnxN layers (MCp)(2)Mn was used as a Mn-precursor The flow of the Mn precursor was 0.2-3.2 mu mol.min(-1). The deposition of Ga1-xMnxN layers was carried out under the pressure of 200 mbar the temperature 1050 degrees C and the V/III ratio of 1360. For the growth of high quality GaN:Mn layers it was necessary to grow these layers on a minimally partially coalesced layer of pure GaN. The direct deposition of GaN:Mn layer on the low temperature GaN buffer layer led to a three-dimensional growth during the whole deposition process. Another investigated parameter was the influence of nitrogen on the layer's properties. A nearly constant ferromagnetic moment persisting up to room temperature was observed on the synthesized thin films.
  • In this contribution we present a growth of Ga1-xMnxN layers by MOVPE. Mn doped GaN layers were grown with and without undoped GaN templates on (0001) sapphire substrates in a quartz horizontal reactor. For the deposition of Ga1-xMnxN layers (MCp)(2)Mn was used as a Mn-precursor The flow of the Mn precursor was 0.2-3.2 mu mol.min(-1). The deposition of Ga1-xMnxN layers was carried out under the pressure of 200 mbar the temperature 1050 degrees C and the V/III ratio of 1360. For the growth of high quality GaN:Mn layers it was necessary to grow these layers on a minimally partially coalesced layer of pure GaN. The direct deposition of GaN:Mn layer on the low temperature GaN buffer layer led to a three-dimensional growth during the whole deposition process. Another investigated parameter was the influence of nitrogen on the layer's properties. A nearly constant ferromagnetic moment persisting up to room temperature was observed on the synthesized thin films. (en)
Title
  • Mn DOPING OF GaN LAYERS GROWN BY MOVPE
  • Mn DOPING OF GaN LAYERS GROWN BY MOVPE (en)
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  • Mn DOPING OF GaN LAYERS GROWN BY MOVPE
  • Mn DOPING OF GaN LAYERS GROWN BY MOVPE (en)
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  • RIV/60461373:22310/12:43893551!RIV13-GA0-22310___
http://linked.open...avai/predkladatel
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  • P(GA104/09/0621), P(GA106/09/0125), S, Z(AV0Z10100521), Z(MSM6046137302)
http://linked.open...iv/cisloPeriodika
  • 2
http://linked.open...vai/riv/dodaniDat
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  • 150818
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  • RIV/60461373:22310/12:43893551
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • Semiconducting III-V materials; Magnetic materials; Nitrides; Metalorganic vapor phase epitaxy (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • CZ - Česká republika
http://linked.open...ontrolniKodProRIV
  • [68939DCE2458]
http://linked.open...i/riv/nazevZdroje
  • Ceramics-Silikáty
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 56
http://linked.open...iv/tvurceVysledku
  • Sofer, Zdeněk
  • Šimek, Petr
  • Maryško, Miroslav
  • Sedmidubský, David
  • Hejtmánek, Jiří
  • Jankovský, Ondřej
  • Mikulics, Martin
  • Václavů, Michal
http://linked.open...ain/vavai/riv/wos
  • 000307678000006
http://linked.open...n/vavai/riv/zamer
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  • 0862-5468
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  • 22310
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