About: Ablation and water etching of poly(ethylene) modified by Ar plasma

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Ablace a vodní leptání polyethylenu modifikovaného Ar plasmou (cs) Ablation and water etching of high density polyethylene (PE) exposed to Ar plasma for 240 s at 8.3 W power were studied. Gravimetry was used to determine the ablated and etched layer thicknesses. The surface topography and roughness were observed via AFM. The chemical composition and structure of modified surface layer were studied by FTIR, XPS, RBS, and EPR techniques. It was found that under the experimental conditions ca. 30 nm thick layer is ablated, the surface topography changes dramatically and surface roughness increases. The cleavage of macromolecular chains is proved by the presence of surface free radicals. Oxygen containing groups known to enhance surface solubility are detected. Under present laboratory conditions ca. 20 nm thick surface layer is dissolved during 24 h. After water dissolution of the surface, the roughness increases. Ablation and water etching of high density polyethylene (PE) exposed to Ar plasma for 240 s at 8.3 W power were studied. Gravimetry was used to determine the ablated and etched layer thicknesses. The surface topography and roughness were observed via AFM. The chemical composition and structure of modified surface layer were studied by FTIR, XPS, RBS, and EPR techniques. It was found that under the experimental conditions ca. 30 nm thick layer is ablated, the surface topography changes dramatically and surface roughness increases. The cleavage of macromolecular chains is proved by the presence of surface free radicals. Oxygen containing groups known to enhance surface solubility are detected. Under present laboratory conditions ca. 20 nm thick surface layer is dissolved during 24 h. After water dissolution of the surface, the roughness increases. (en)
Title	Ablation and water etching of poly(ethylene) modified by Ar plasma Ablace a vodní leptání polyethylenu modifikovaného Ar plasmou (cs) Ablation and water etching of poly(ethylene) modified by Ar plasma (en)
skos:prefLabel	Ablation and water etching of poly(ethylene) modified by Ar plasma Ablace a vodní leptání polyethylenu modifikovaného Ar plasmou (cs) Ablation and water etching of poly(ethylene) modified by Ar plasma (en)
skos:notation	RIV/60461373:22310/07:00020194!RIV09-AV0-22310___
http://linked.open...avai/riv/aktivita	P
http://linked.open...avai/riv/aktivity	P(KAN400480701)
http://linked.open...iv/cisloPeriodika	9
http://linked.open...vai/riv/dodaniDat	2009
http://linked.open...aciTvurceVysledku	Švorčík, Václav Sajdl, Petr
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Vysoká škola chemicko-technologická v Praze / Fakulta chemické technologie
http://linked.open...dnocenehoVysledku	408303
http://linked.open...ai/riv/idVysledku	RIV/60461373:22310/07:00020194
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	polyethylene; plasma; chemical structures; ablation; water etching (en)
http://linked.open.../riv/klicoveSlovo	chemical structures ablation plasma polyethylene water etching
http://linked.open...odStatuVydavatele	NL - Nizozemsko
http://linked.open...ontrolniKodProRIV	[44074412ED33]
http://linked.open...i/riv/nazevZdroje	Polymer Degradation and Stability
http://linked.open...in/vavai/riv/obor	CD
http://linked.open...ichTvurcuVysledku	2 (xsd:int)
http://linked.open...cetTvurcuVysledku	6 (xsd:int)
http://linked.open...vavai/riv/projekt	NANOSTRUCTURES BASED ON CARBON AND POLYMERS FOR APPLICATION IN BIOELECTRONIC AND MEDICINE
http://linked.open...UplatneniVysledku	2007
http://linked.open...v/svazekPeriodika	92
http://linked.open...iv/tvurceVysledku	Hnatowicz, Vladimír Macková, Anna Sajdl, Petr Siegel, Jakub Švorčík, Václav Kotál, Vladimír
http://linked.open...ain/vavai/riv/wos	000250076900001
issn	0141-3910
number of pages	5 (xsd:int)
http://localhost/t...ganizacniJednotka	22310
is http://linked.open...avai/riv/vysledek of	Ablation and water etching of poly(ethylene) modified by Ar plasma Ablation and water etching of poly(ethylene) modified by Ar plasma Ablation and water etching of poly(ethylene) modified by Ar plasma

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