About: Investigation of RF and DC plasma - jet system during deposition of highly oriented ZnO Films

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About: Investigation of RF and DC plasma - jet system during deposition of highly oriented ZnO Films Goto Sponge NotDistinct Permalink

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	RF and DC plasma jet sputtering systems were investigated as a source for deposition of ZnO thin films. Deposited ZnO films have a strong orientation of hexagonal crystallities with 'c' axis perpendicular to the substrate surface. Temperature of the substrate did not exceed 150oC during the deposition. Langmuir probe measurement performed at the substrate revealed two group of electrons with approximate maxwellian distribution in the DC plasma jet and one maxwellian group in the case of RF plasma jet system. Electron concentration in the RF jet was about 5 109 - 1010 cm-3 with electron temperature 2.5 -3.5 eV. Concentration of cold electrons in the DC jet was usually 109 cm-3 with temperature 0.5 eV and hot electrons 108 cm-3 with temperature 2-3.5 eV. Photography also confirmed that plasma density is higher in the position of the substrate in the RF jet than in the DC jet. Other obtained macroscopic parameters as plasma potential, floating potential and DC voltage of the Zn nozzle relative to RF and DC plasma jet sputtering systems were investigated as a source for deposition of ZnO thin films. Deposited ZnO films have a strong orientation of hexagonal crystallities with 'c' axis perpendicular to the substrate surface. Temperature of the substrate did not exceed 150oC during the deposition. Langmuir probe measurement performed at the substrate revealed two group of electrons with approximate maxwellian distribution in the DC plasma jet and one maxwellian group in the case of RF plasma jet system. Electron concentration in the RF jet was about 5 109 - 1010 cm-3 with electron temperature 2.5 -3.5 eV. Concentration of cold electrons in the DC jet was usually 109 cm-3 with temperature 0.5 eV and hot electrons 108 cm-3 with temperature 2-3.5 eV. Photography also confirmed that plasma density is higher in the position of the substrate in the RF jet than in the DC jet. Other obtained macroscopic parameters as plasma potential, floating potential and DC voltage of the Zn nozzle relative to (en)
Title	Investigation of RF and DC plasma - jet system during deposition of highly oriented ZnO Films Investigation of RF and DC plasma - jet system during deposition of highly oriented ZnO Films (en)
skos:prefLabel	Investigation of RF and DC plasma - jet system during deposition of highly oriented ZnO Films Investigation of RF and DC plasma - jet system during deposition of highly oriented ZnO Films (en)
skos:notation	RIV/60076658:12410/03:00004555!RIV/2004/MSM/124104/N
http://linked.open.../vavai/riv/strany	627-631
http://linked.open...avai/riv/aktivita	Z
http://linked.open...avai/riv/aktivity	Z(MSM 124100004)
http://linked.open...iv/cisloPeriodika	174-175
http://linked.open...vai/riv/dodaniDat	2004
http://linked.open...aciTvurceVysledku	Šícha, Miloš Adámek, Petr
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Jihočeská univerzita v Českých Budějovicích / Pedagogická fakulta
http://linked.open...dnocenehoVysledku	611171
http://linked.open...ai/riv/idVysledku	RIV/60076658:12410/03:00004555
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	Langmuir probe measurement, RF, DC, deposition process (en)
http://linked.open.../riv/klicoveSlovo	DC deposition process RF Langmuir probe measurement
http://linked.open...odStatuVydavatele	NL - Nizozemsko
http://linked.open...ontrolniKodProRIV	[7359340D76FB]
http://linked.open...i/riv/nazevZdroje	In: Surface and Coatings Technology
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	2 (xsd:int)
http://linked.open...cetTvurcuVysledku	8 (xsd:int)
http://linked.open...ocetUcastnikuAkce	0 (xsd:int)
http://linked.open...nichUcastnikuAkce	0 (xsd:int)
http://linked.open...UplatneniVysledku	2003
http://linked.open...v/svazekPeriodika	2003
http://linked.open...iv/tvurceVysledku	Adámek, Petr Jastrabík, L. Soukup, L. Ptáček, P. Hubička, Z. Čada, M. Šícha, Miloš Šíchová, H.
http://linked.open...n/vavai/riv/zamer	http://linked.opendata.cz/resource/domain/vavai/zamer/MSM%20124100004
issn	0257-8972
number of pages	5 (xsd:int)
http://localhost/t...ganizacniJednotka	12410

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