About: Self-texture control of Zno films prepared by reactive RF magnetron sputtering

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About: Self-texture control of Zno films prepared by reactive RF magnetron sputtering Goto Sponge NotDistinct Permalink

An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Zinc Oxide (ZnO) is a wide bandgap semiconductor material which can be successfully used for wide variety of potential applications such as biosensors or acoustic resonator devices. ZnO normally crystallizes in the wurtzite structure with c-axis (001) preferred orientation. However, for bio-sensing in liquids, it is necessary to generate a shear horizontal mode wave, where the wave displacement is within the plane of the crystal surface. For generation of such a shear horizontal wave, a-axis film textures such as the (110) or (100) is necessary. This work is focused on the preferred orientation control of ZnO film prepared by RF magnetron sputtering. It is found that preferred orientation can be controlled by substrate bias and substrate temperature during deposition without the use of expensive crystalline substrates. There are three areas of operating parameters when the structure of the ZnO films is dominated by different preferred orientation. Moreover, the film annealing was performed to enhance the film structure. Zinc Oxide (ZnO) is a wide bandgap semiconductor material which can be successfully used for wide variety of potential applications such as biosensors or acoustic resonator devices. ZnO normally crystallizes in the wurtzite structure with c-axis (001) preferred orientation. However, for bio-sensing in liquids, it is necessary to generate a shear horizontal mode wave, where the wave displacement is within the plane of the crystal surface. For generation of such a shear horizontal wave, a-axis film textures such as the (110) or (100) is necessary. This work is focused on the preferred orientation control of ZnO film prepared by RF magnetron sputtering. It is found that preferred orientation can be controlled by substrate bias and substrate temperature during deposition without the use of expensive crystalline substrates. There are three areas of operating parameters when the structure of the ZnO films is dominated by different preferred orientation. Moreover, the film annealing was performed to enhance the film structure. (en)
Title	Self-texture control of Zno films prepared by reactive RF magnetron sputtering Self-texture control of Zno films prepared by reactive RF magnetron sputtering (en)
skos:prefLabel	Self-texture control of Zno films prepared by reactive RF magnetron sputtering Self-texture control of Zno films prepared by reactive RF magnetron sputtering (en)
skos:notation	RIV/49777513:23640/14:43923268!RIV15-MSM-23640___
http://linked.open...avai/riv/aktivita	P
http://linked.open...avai/riv/aktivity	P(ED2.1.00/03.0088)
http://linked.open...vai/riv/dodaniDat	2015
http://linked.open...aciTvurceVysledku	Netrvalová, Marie Šutta, Pavol Medlín, Rostislav Novák, Petr Říha, Jan
http://linked.open.../riv/druhVysledku	D - Článek ve sborníku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Západočeská univerzita v Plzni / Nové technologie - výzkumné centrum
http://linked.open...dnocenehoVysledku	44362
http://linked.open...ai/riv/idVysledku	RIV/49777513:23640/14:43923268
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	thin films; magnetron sputtering; preferred orientation; structure; ZnO (en)
http://linked.open.../riv/klicoveSlovo	magnetron sputtering structure thin films ZnO preferred orientation
http://linked.open...ontrolniKodProRIV	[9368EC059E4B]
http://linked.open...v/mistoKonaniAkce	Praha
http://linked.open...i/riv/mistoVydani	Stafa-Zurich
http://linked.open...i/riv/nazevZdroje	Key Engineering Materials
http://linked.open...in/vavai/riv/obor	JJ
http://linked.open...ichTvurcuVysledku	5 (xsd:int)
http://linked.open...cetTvurcuVysledku	5 (xsd:int)
http://linked.open...vavai/riv/projekt	Centre of the New Technologies and Materials
http://linked.open...UplatneniVysledku	2014
http://linked.open...iv/tvurceVysledku	Novák, Petr Netrvalová, Marie Říha, Jan Šutta, Pavol Medlín, Rostislav
http://linked.open...vavai/riv/typAkce	WRD - Světová
http://linked.open.../riv/zahajeniAkce	2013-09-13 (xsd:date)
issn	1013-9826
number of pages	4 (xsd:int)
http://bibframe.org/vocab/doi	10.4028/www.scientific.net/KEM.605.219
http://purl.org/ne...btex#hasPublisher	Trans Tech Publications LTD
https://schema.org/isbn	978-3-03835-051-4
http://localhost/t...ganizacniJednotka	23640

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