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Description
| - Magnetron sputtering and subsequent annealing are used for preparing polycrystalline ZnO films with specific preferred orientation of the crystallites. The preferred orientation is determined by the substrate temperature during deposition and energy of ions accelerated by bias to the growth film. Subsequent annealing is used to eliminate tension and defects which arose as result of causes by iont bombardment. The production procedure was verified by X-ray diffraction, which confirmed the preferential orientation of the resulting ZnO film.
- Magnetron sputtering and subsequent annealing are used for preparing polycrystalline ZnO films with specific preferred orientation of the crystallites. The preferred orientation is determined by the substrate temperature during deposition and energy of ions accelerated by bias to the growth film. Subsequent annealing is used to eliminate tension and defects which arose as result of causes by iont bombardment. The production procedure was verified by X-ray diffraction, which confirmed the preferential orientation of the resulting ZnO film. (en)
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Title
| - Preferred orientation control of ZnO polycrystalline films deposited by magnetron sputtering
- Preferred orientation control of ZnO polycrystalline films deposited by magnetron sputtering (en)
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skos:prefLabel
| - Preferred orientation control of ZnO polycrystalline films deposited by magnetron sputtering
- Preferred orientation control of ZnO polycrystalline films deposited by magnetron sputtering (en)
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skos:notation
| - RIV/49777513:23640/13:43921041!RIV14-MSM-23640___
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http://linked.open...avai/predkladatel
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http://linked.open...avai/riv/aktivita
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http://linked.open...avai/riv/aktivity
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http://linked.open...vai/riv/dodaniDat
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http://linked.open...aciTvurceVysledku
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http://linked.open.../riv/druhVysledku
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http://linked.open...iv/duvernostUdaju
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http://linked.open...onomickeParametry
| - Výsledek je využíván příjemcem Západočeská univerzita v Plzni (IČO 49777513), ekonomické parametry se neuvádí.
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http://linked.open...titaPredkladatele
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http://linked.open...dnocenehoVysledku
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http://linked.open...ai/riv/idVysledku
| - RIV/49777513:23640/13:43921041
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http://linked.open...terniIdentifikace
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http://linked.open...riv/jazykVysledku
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http://linked.open...vai/riv/kategorie
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http://linked.open.../riv/klicovaSlova
| - magnetron sputtering; preferred orientation; ZnO film (en)
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http://linked.open.../riv/klicoveSlovo
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http://linked.open...ontrolniKodProRIV
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http://linked.open...in/vavai/riv/obor
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http://linked.open...ichTvurcuVysledku
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http://linked.open...cetTvurcuVysledku
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http://linked.open...vavai/riv/projekt
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http://linked.open...UplatneniVysledku
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http://linked.open...echnickeParametry
| - Ve výrobní postupu je k řízení preferenční orientace využíván deposiční systém BOC Edwards TF 600 obsahující magnetron pro naprašování z terče, který umožnuje i následné žíhání do 400°C. Proces by mohl být snadno přenesen i na jiné zařízení využívající magnetronové naprašování. David Lávička, Západočeská univerzita v Plzni (IČO 49777513), Nové technologie - výzkumné centrum, Univerzitní 8, 306 14 Plzeň, 377634714, dlavicka@ntc.zcu.cz. Viz odkaz http://www.ntc.zcu.cz/vysledky/ot/NTC-OTE-13-001.html
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http://linked.open...iv/tvurceVysledku
| - Novák, Petr
- Netrvalová, Marie
- Říha, Jan
- Šutta, Pavol
- Medlín, Rostislav
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http://linked.open...avai/riv/vlastnik
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http://linked.open...itiJinymSubjektem
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http://localhost/t...ganizacniJednotka
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