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  • A study of the effect of substrate temperature on oblique-angle sputtered galium- doped zinc oxide (GZO) thin films was carried out. Both the oblique-angle sputtering and the substrate temperature lowered the resistivity of GZO thin films down to 4 x 10 -3 ohm cm together with an increase of their optical transmittance over 90%.
  • A study of the effect of substrate temperature on oblique-angle sputtered galium- doped zinc oxide (GZO) thin films was carried out. Both the oblique-angle sputtering and the substrate temperature lowered the resistivity of GZO thin films down to 4 x 10 -3 ohm cm together with an increase of their optical transmittance over 90%. (en)
Title
  • Effect of Substrate Temperature on Oblique-Angle Sputtered ZnO:Ga Thin Films
  • Effect of Substrate Temperature on Oblique-Angle Sputtered ZnO:Ga Thin Films (en)
skos:prefLabel
  • Effect of Substrate Temperature on Oblique-Angle Sputtered ZnO:Ga Thin Films
  • Effect of Substrate Temperature on Oblique-Angle Sputtered ZnO:Ga Thin Films (en)
skos:notation
  • RIV/49777513:23640/10:00503489!RIV11-MSM-23640___
http://linked.open...avai/riv/aktivita
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  • P(1M06031)
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  • 256183
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  • RIV/49777513:23640/10:00503489
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  • oblique-angle sputtering; ZnO:Ga; deposition temperature (en)
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  • [606F2814B66B]
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  • Smolenice Castle, Slovakia
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  • New York
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  • ASDAM 2010
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  • Novotný, Ivan
  • Netrvalová, Marie
  • Šutta, Pavol
  • Flickyngerová, Soňa
  • Tvarožek, Vladimír
  • Kotorová, Dominika
  • Schaaf, P.
  • Spiess, L.
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number of pages
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  • IEEE Nuclear and Plasma Sciences Society
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  • 978-1-4244-8572-7
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  • 23640
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