About: Medium-range order in a-Si:H films prepared from hydrogen diluted silane

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Description	A systematic and detailed analysis of the influence of hydrogen (H2) dilution of silane (SiH4) on the structural properties of thin hydrogenated silicon (Si:H) films was carried out. The Si:H films were prepared by plasma enhanced chemical vapour deposition method at different H2 to SiH4 flow ratios (R) ranging from R=0 to 40. A detailed structural analysis was carried out by X-ray diffraction (XRD). In order to suppress the XRD intensity from the substrate, Si:H films were deposited onto a [100]-oriented single-crystalline silicon substrate and XRD was carried out with a thin-film attachment. The XRD analysis demonstrated that the first diffraction peak in the Si:H films corresponded to the signal from silicon hydride (Si4H) ordered domains having tetragonal lattice structure. The full width of half maximum (FWHM) of the peak was decreasing with increasing H2 dilution, and remained nearly constant for R>20. The FWHMvalues confirmed that the Si:H films grown at R>20 are more ordered than films d A systematic and detailed analysis of the influence of hydrogen (H2) dilution of silane (SiH4) on the structural properties of thin hydrogenated silicon (Si:H) films was carried out. The Si:H films were prepared by plasma enhanced chemical vapour deposition method at different H2 to SiH4 flow ratios (R) ranging from R=0 to 40. A detailed structural analysis was carried out by X-ray diffraction (XRD). In order to suppress the XRD intensity from the substrate, Si:H films were deposited onto a [100]-oriented single-crystalline silicon substrate and XRD was carried out with a thin-film attachment. The XRD analysis demonstrated that the first diffraction peak in the Si:H films corresponded to the signal from silicon hydride (Si4H) ordered domains having tetragonal lattice structure. The full width of half maximum (FWHM) of the peak was decreasing with increasing H2 dilution, and remained nearly constant for R>20. The FWHMvalues confirmed that the Si:H films grown at R>20 are more ordered than films d (en)
Title	Medium-range order in a-Si:H films prepared from hydrogen diluted silane Medium-range order in a-Si:H films prepared from hydrogen diluted silane (en)
skos:prefLabel	Medium-range order in a-Si:H films prepared from hydrogen diluted silane Medium-range order in a-Si:H films prepared from hydrogen diluted silane (en)
skos:notation	RIV/49777513:23640/10:00503362!RIV11-MSM-23640___
http://linked.open...avai/riv/aktivita	P
http://linked.open...avai/riv/aktivity	P(1M06031)
http://linked.open...iv/cisloPeriodika	3
http://linked.open...vai/riv/dodaniDat	2011
http://linked.open...aciTvurceVysledku	Šutta, Pavol Vavruňková, Veronika
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Západočeská univerzita v Plzni / Nové technologie - výzkumné centrum
http://linked.open...dnocenehoVysledku	270284
http://linked.open...ai/riv/idVysledku	RIV/49777513:23640/10:00503362
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	a-Si:H thin films; XRD analysis; Raman spectroscopy; medium-range order (en)
http://linked.open.../riv/klicoveSlovo	Raman spectroscopy XRD analysis a-Si:H thin films medium-range order
http://linked.open...odStatuVydavatele	DE - Spolková republika Německo
http://linked.open...ontrolniKodProRIV	[B10A185F4AB1]
http://linked.open...i/riv/nazevZdroje	Physica Status Solidi A - Applications and Materials Science
http://linked.open...in/vavai/riv/obor	BM
http://linked.open...ichTvurcuVysledku	2 (xsd:int)
http://linked.open...cetTvurcuVysledku	4 (xsd:int)
http://linked.open...vavai/riv/projekt	Materials and components for environment protection
http://linked.open...UplatneniVysledku	2010
http://linked.open...v/svazekPeriodika	207
http://linked.open...iv/tvurceVysledku	Šutta, Pavol Zeman, Miro Vavruňková, Veronika van Elzakker, Gijs
issn	1862-6300
number of pages	4 (xsd:int)
http://localhost/t...ganizacniJednotka	23640
is http://linked.open...avai/riv/vysledek of	Medium-range order in a-Si:H films prepared from hydrogen diluted silane Medium-range order in a-Si:H films prepared from hydrogen diluted silane Medium-range order in a-Si:H films prepared from hydrogen diluted silane

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