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Description
| - Thin-film poly-crystalline silicon (poly c-Si) on glass obtained by crystallization of an amorphous silicon (a-Si) film is a promising material for low cost, high efficiency solar cells. Our approach to obtain this material is to crystallize a-Si films on glass by solid phase crystallization (SPC). As the grain size of SPC poly c-Si films will be smaller than that of multi-crystalline wafers, lower solar cell efficiencies are expected for this technology. Despite the smaller grain size, a 2-micron-thick polycrystalline silicon solar cell with light trapping was shown to have a conversion efficiency of more than 10% [1]. Obtainable efficiencies up to 15% are expected for solar cells made using SPC of a-Si:H films. Expanding thermal plasma chemical vapor deposition (ETP-CVD) was used to prepare hydrogenated a-Si films; this technique is chosen because the deposition rates are much higher than with plasma enhanced CVD. A-Si:H films with different hydrogen contents were annealed using temperatures ranging
- Thin-film poly-crystalline silicon (poly c-Si) on glass obtained by crystallization of an amorphous silicon (a-Si) film is a promising material for low cost, high efficiency solar cells. Our approach to obtain this material is to crystallize a-Si films on glass by solid phase crystallization (SPC). As the grain size of SPC poly c-Si films will be smaller than that of multi-crystalline wafers, lower solar cell efficiencies are expected for this technology. Despite the smaller grain size, a 2-micron-thick polycrystalline silicon solar cell with light trapping was shown to have a conversion efficiency of more than 10% [1]. Obtainable efficiencies up to 15% are expected for solar cells made using SPC of a-Si:H films. Expanding thermal plasma chemical vapor deposition (ETP-CVD) was used to prepare hydrogenated a-Si films; this technique is chosen because the deposition rates are much higher than with plasma enhanced CVD. A-Si:H films with different hydrogen contents were annealed using temperatures ranging (en)
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Title
| - Formation of thin-film crystalline silicon on glass observed by in-situ XRD
- Formation of thin-film crystalline silicon on glass observed by in-situ XRD (en)
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skos:prefLabel
| - Formation of thin-film crystalline silicon on glass observed by in-situ XRD
- Formation of thin-film crystalline silicon on glass observed by in-situ XRD (en)
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skos:notation
| - RIV/49777513:23640/10:00503276!RIV11-MSM-23640___
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http://linked.open...avai/riv/aktivita
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http://linked.open...avai/riv/aktivity
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| - RIV/49777513:23640/10:00503276
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http://linked.open...riv/jazykVysledku
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| - x-ray diffraction; Silicon; Crystallization; Solar cells (en)
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| - Šutta, Pavol
- Zeman, Miro
- Vavruňková, Veronika
- Westra, J. M.
- van Swaaij, R. A. C. M. M.
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