About: Structural changes studies of a-Si:H films deposited by PECVD under different hydrogen dilutions using various experimental techniques

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About: Structural changes studies of a-Si:H films deposited by PECVD under different hydrogen dilutions using various experimental techniques Goto Sponge NotDistinct Permalink

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Plasma enhanced chemical vapour deposition (PECVD) has been used to prepare hydrogenated amorphous silicon (a-Si:H) thin films at different hydrogen dilution of silane source gas. The films were deposited on Corning glass 1737 substrate and on (100) oriented c-Si wafers and characterized by XRD diffraction, micro-Raman and FTIR spectrometry. Experimental data show evolution from amorphous to nanocrystalline silicon and contain the medium-range order (MRO) with varying hydrogen dilution during deposition. From X-ray diffraction and Raman analysis, it is found that the presence of crystalline phase depends on the kind of substrate and on the dilution scale. Plasma enhanced chemical vapour deposition (PECVD) has been used to prepare hydrogenated amorphous silicon (a-Si:H) thin films at different hydrogen dilution of silane source gas. The films were deposited on Corning glass 1737 substrate and on (100) oriented c-Si wafers and characterized by XRD diffraction, micro-Raman and FTIR spectrometry. Experimental data show evolution from amorphous to nanocrystalline silicon and contain the medium-range order (MRO) with varying hydrogen dilution during deposition. From X-ray diffraction and Raman analysis, it is found that the presence of crystalline phase depends on the kind of substrate and on the dilution scale. (en)
Title	Structural changes studies of a-Si:H films deposited by PECVD under different hydrogen dilutions using various experimental techniques Structural changes studies of a-Si:H films deposited by PECVD under different hydrogen dilutions using various experimental techniques (en)
skos:prefLabel	Structural changes studies of a-Si:H films deposited by PECVD under different hydrogen dilutions using various experimental techniques Structural changes studies of a-Si:H films deposited by PECVD under different hydrogen dilutions using various experimental techniques (en)
skos:notation	RIV/49777513:23640/09:00502097!RIV10-MSM-23640___
http://linked.open...avai/riv/aktivita	P
http://linked.open...avai/riv/aktivity	P(1M06031)
http://linked.open...iv/cisloPeriodika	1
http://linked.open...vai/riv/dodaniDat	2010
http://linked.open...aciTvurceVysledku	Šutta, Pavol Vavruňková, Veronika
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Západočeská univerzita v Plzni / Nové technologie - výzkumné centrum
http://linked.open...dnocenehoVysledku	344134
http://linked.open...ai/riv/idVysledku	RIV/49777513:23640/09:00502097
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	thin film silicon; medium-range order; grain size; hydrogen dilution; microstructure; X-ray diffraction; Raman analysis; FTIR spectrometry (en)
http://linked.open.../riv/klicoveSlovo	FTIR spectrometry thin film silicon grain size X-ray diffraction microstructure medium-range order Raman analysis hydrogen dilution
http://linked.open...odStatuVydavatele	GB - Spojené království Velké Británie a Severního Irska
http://linked.open...ontrolniKodProRIV	[CF2086A034BF]
http://linked.open...i/riv/nazevZdroje	Vacuum
http://linked.open...in/vavai/riv/obor	BM
http://linked.open...ichTvurcuVysledku	2 (xsd:int)
http://linked.open...cetTvurcuVysledku	4 (xsd:int)
http://linked.open...vavai/riv/projekt	Materials and components for environment protection
http://linked.open...UplatneniVysledku	2009
http://linked.open...v/svazekPeriodika	84
http://linked.open...iv/tvurceVysledku	Šutta, Pavol Müllerová, Jarmila Vavruňková, Veronika Srnánek, Rudolf
http://linked.open...ain/vavai/riv/wos	000270625900031
issn	0042-207X
number of pages	3 (xsd:int)
http://localhost/t...ganizacniJednotka	23640
is http://linked.open...avai/riv/vysledek of	Structural changes studies of a-Si:H films deposited by PECVD under different hydrogen dilutions using various experimental techniques Structural changes studies of a-Si:H films deposited by PECVD under different hydrogen dilutions using various experimental techniques Structural changes studies of a-Si:H films deposited by PECVD under different hydrogen dilutions using various experimental techniques Structural changes studies of a-Si:H films deposited by PECVD under different hydrogen dilutions using various experimental techniques

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