About: Reactive magnetron sputtering of carbon nitride films: characterization of ion bombardment and optical emission spectroscopy in deposition zone

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About: Reactive magnetron sputtering of carbon nitride films: characterization of ion bombardment and optical emission spectroscopy in deposition zone Goto Sponge NotDistinct Permalink

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	CNx films were deposited on Si(100) substrates at a substrate temperature of 600 C using DC magnetron sputtering of a high-purity graphite target in pure nitrogen. The film characteristics were primarily controlled by the pressure, p, (0.05 to 5 Pa), thedischarge current in the magnetron target, Im, (0.5 to 3 A), and the RF-induced negative substrate bias voltage, Ub, (-300 to -1200 V). The films were found to be amorphous, and they possessed the N/C atomic concentration ratio up to 0.35, the hardness uto 40 GPa, the elastic recovery up to 85%, and good adhesion and promising tribological properties. A complex relationship between the process parameters and the film characteristics was investigated on the basis of correlations between the process parameters and the respective internal plasma parameters, such as ion bombardment characteristics and the densities of N atoms and CN radicals in front of the substrate. CNx films were deposited on Si(100) substrates at a substrate temperature of 600 C using DC magnetron sputtering of a high-purity graphite target in pure nitrogen. The film characteristics were primarily controlled by the pressure, p, (0.05 to 5 Pa), thedischarge current in the magnetron target, Im, (0.5 to 3 A), and the RF-induced negative substrate bias voltage, Ub, (-300 to -1200 V). The films were found to be amorphous, and they possessed the N/C atomic concentration ratio up to 0.35, the hardness uto 40 GPa, the elastic recovery up to 85%, and good adhesion and promising tribological properties. A complex relationship between the process parameters and the film characteristics was investigated on the basis of correlations between the process parameters and the respective internal plasma parameters, such as ion bombardment characteristics and the densities of N atoms and CN radicals in front of the substrate. (en)
Title	Reactive magnetron sputtering of carbon nitride films: characterization of ion bombardment and optical emission spectroscopy in deposition zone Reactive magnetron sputtering of carbon nitride films: characterization of ion bombardment and optical emission spectroscopy in deposition zone (en)
skos:prefLabel	Reactive magnetron sputtering of carbon nitride films: characterization of ion bombardment and optical emission spectroscopy in deposition zone Reactive magnetron sputtering of carbon nitride films: characterization of ion bombardment and optical emission spectroscopy in deposition zone (en)
skos:notation	RIV/49777513:23520/99:00042299!RIV/2000/MSM/235200
http://linked.open.../vavai/riv/strany	1497
http://linked.open...avai/riv/aktivita	P Z
http://linked.open...avai/riv/aktivity	P(GV106/96/K245), P(VS96059), Z(MSM 235200002)
http://linked.open...vai/riv/dodaniDat	2000
http://linked.open...aciTvurceVysledku	Vlček, Jaroslav Hájek, Václav Rusňák, Karel
http://linked.open.../riv/druhVysledku	C - Kapitola v knize
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Západočeská univerzita v Plzni / Fakulta aplikovaných věd
http://linked.open...dnocenehoVysledku	752006
http://linked.open...ai/riv/idVysledku	RIV/49777513:23520/99:00042299
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open...ontrolniKodProRIV	[57A62C4CE58F]
http://linked.open...i/riv/mistoVydani	Praha
http://linked.open...vEdiceCisloSvazku	Roč.^14
http://linked.open...i/riv/nazevZdroje	Reactive magnetron sputtering of carbon nitride films: characterization of ion bombardment and optical emission spectroscopy in deposition zone
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	3 (xsd:int)
http://linked.open...cetTvurcuVysledku	3 (xsd:int)
http://linked.open...vavai/riv/projekt	Hard and superhard coatings prepared by unconventional plasma processes A scientific team for plasma physics and plasma technologies
http://linked.open...UplatneniVysledku	1999
http://linked.open...iv/tvurceVysledku	Vlček, Jaroslav Hájek, Václav Rusňák, Karel
http://linked.open...n/vavai/riv/zamer	http://linked.opendata.cz/resource/domain/vavai/zamer/MSM%20235200002
number of pages	6 (xsd:int)
http://purl.org/ne...btex#hasPublisher	Akademie věd České republiky
https://schema.org/isbn	80-902724-0-1
http://localhost/t...ganizacniJednotka	23520

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