About: Hard multifunctional Hf-B-Si-C films prepared by pulsed magnetron sputtering

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About: Hard multifunctional Hf-B-Si-C films prepared by pulsed magnetron sputtering Goto Sponge NotDistinct Permalink

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Attributes	Values
rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
rdfs:seeAlso	http://dx.doi.org/10.1016/j.surfcoat.2013.12.007
Description	Hf-B-Si-C films were deposited onto silicon and glass substrates using pulsed magnetron co-sputtering of a single B4C-Hf-Si target (at a fixed 15% Hf fraction and a varying 0-50% Si fraction in the target erosion area) in pure argon. We focus on the effect of the Si content in the films. The film structure changes from nanocolumnar (at 0-7 at.% of Si) to nanocomposite (at around 10 at.% of Si) to amorphous (at higher Si contents). Both nanocolumnar and nanocomposite HfB2-based films exhibit a hardness of up to 37 GPa and a high H/E* ratio of around 0.15. The Si incorporation leads to a significant reduction of the compressive stress of films and improvement of their oxidation resistance (unmeasurable mass change after annealing up to 800 °C at 35 at.% of Si). All films exhibit a high electrical conductivity and very smooth defect-free surfaces with an average roughness below 1 nm. Consequently, the films may be used as a new class of hard and electrically conductive protective coatings with a high oxidation resistance at elevated temperatures. Hf-B-Si-C films were deposited onto silicon and glass substrates using pulsed magnetron co-sputtering of a single B4C-Hf-Si target (at a fixed 15% Hf fraction and a varying 0-50% Si fraction in the target erosion area) in pure argon. We focus on the effect of the Si content in the films. The film structure changes from nanocolumnar (at 0-7 at.% of Si) to nanocomposite (at around 10 at.% of Si) to amorphous (at higher Si contents). Both nanocolumnar and nanocomposite HfB2-based films exhibit a hardness of up to 37 GPa and a high H/E* ratio of around 0.15. The Si incorporation leads to a significant reduction of the compressive stress of films and improvement of their oxidation resistance (unmeasurable mass change after annealing up to 800 °C at 35 at.% of Si). All films exhibit a high electrical conductivity and very smooth defect-free surfaces with an average roughness below 1 nm. Consequently, the films may be used as a new class of hard and electrically conductive protective coatings with a high oxidation resistance at elevated temperatures. (en)
Title	Hard multifunctional Hf-B-Si-C films prepared by pulsed magnetron sputtering Hard multifunctional Hf-B-Si-C films prepared by pulsed magnetron sputtering (en)
skos:prefLabel	Hard multifunctional Hf-B-Si-C films prepared by pulsed magnetron sputtering Hard multifunctional Hf-B-Si-C films prepared by pulsed magnetron sputtering (en)
skos:notation	RIV/49777513:23520/14:43922810!RIV15-GA0-23520___
http://linked.open...avai/riv/aktivita	P
http://linked.open...avai/riv/aktivity	P(GA14-03875S)
http://linked.open...iv/cisloPeriodika	257
http://linked.open...vai/riv/dodaniDat	2015
http://linked.open...aciTvurceVysledku	Mareš, Pavel Zeman, Petr Houška, Jiří Kohout, Jiří Vlček, Jaroslav Čerstvý, Radomír Prokšová, Šárka
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Západočeská univerzita v Plzni / Fakulta aplikovaných věd
http://linked.open...dnocenehoVysledku	18774
http://linked.open...ai/riv/idVysledku	RIV/49777513:23520/14:43922810
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	Oxidation resistance; Electrical conductivity; Hardness; Pulsed magnetron sputtering; Nanocomposite materials; Hf-B-Si-C films (en)
http://linked.open.../riv/klicoveSlovo	Hf-B-Si-C films Electrical conductivity Nanocomposite materials Hardness Oxidation resistance Pulsed magnetron sputtering
http://linked.open...odStatuVydavatele	GB - Spojené království Velké Británie a Severního Irska
http://linked.open...ontrolniKodProRIV	[A9FADFD343DC]
http://linked.open...i/riv/nazevZdroje	Surface and Coatings Technology
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	7 (xsd:int)
http://linked.open...cetTvurcuVysledku	10 (xsd:int)
http://linked.open...vavai/riv/projekt	Nanostructured multifunctional coatings prepared using highly ionized pulsed plasmas
http://linked.open...UplatneniVysledku	2014
http://linked.open...v/svazekPeriodika	2014
http://linked.open...iv/tvurceVysledku	Houška, Jiří Mareš, Pavel Zeman, Petr Vlček, Jaroslav Čerstvý, Radomír Kohout, Jiří Jiang, Jiechao Meletis, Efstathios I. Zhang, Minghui Zuzjaková, Šárka
http://linked.open...ain/vavai/riv/wos	000344423100030
issn	0257-8972
number of pages	7 (xsd:int)
http://bibframe.org/vocab/doi	10.1016/j.surfcoat.2013.12.007
http://localhost/t...ganizacniJednotka	23520

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