About: High-rate reactive high-power impulse magnetron sputtering of Ta-O-N films with tunable composition and properties

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About: High-rate reactive high-power impulse magnetron sputtering of Ta-O-N films with tunable composition and properties Goto Sponge NotDistinct Permalink

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Attributes	Values
rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
rdfs:seeAlso	http://www.sciencedirect.com/science/article/pii/S0040609014007548
Description	High-power impulse magnetron sputtering of a planar Ta target in various Ar+O2+N2 gas mixtures was investigated. A strongly unbalanced magnetron was driven by a pulsed dc power supply at the average target power density in a pulse. Si (100) and glass substrates were at a floating potential, and the substrate temperatures were less than 285 °C. A pulsed reactive gas (O2 and N2) flow control made it possible to produce high-quality Ta-O-N films of various elemental compositions with high deposition rates of 97 - 190 nm/min. The film compositions (in at.%) were varied gradually from Ta28O71 with less than 1 at. % of H to Ta38O4N55 with 3 at. % of H. The Ta27O40N31 films with 2 at. % of H, which were produced with the highest deposition rate of 190 nm/min, were nanocrystalline with an optical band gap of 2.5 eV. These films with a shift of the absorption edge to 500 nm are potential candidates for application as visible-light driven photocatalysts. High-power impulse magnetron sputtering of a planar Ta target in various Ar+O2+N2 gas mixtures was investigated. A strongly unbalanced magnetron was driven by a pulsed dc power supply at the average target power density in a pulse. Si (100) and glass substrates were at a floating potential, and the substrate temperatures were less than 285 °C. A pulsed reactive gas (O2 and N2) flow control made it possible to produce high-quality Ta-O-N films of various elemental compositions with high deposition rates of 97 - 190 nm/min. The film compositions (in at.%) were varied gradually from Ta28O71 with less than 1 at. % of H to Ta38O4N55 with 3 at. % of H. The Ta27O40N31 films with 2 at. % of H, which were produced with the highest deposition rate of 190 nm/min, were nanocrystalline with an optical band gap of 2.5 eV. These films with a shift of the absorption edge to 500 nm are potential candidates for application as visible-light driven photocatalysts. (en)
Title	High-rate reactive high-power impulse magnetron sputtering of Ta-O-N films with tunable composition and properties High-rate reactive high-power impulse magnetron sputtering of Ta-O-N films with tunable composition and properties (en)
skos:prefLabel	High-rate reactive high-power impulse magnetron sputtering of Ta-O-N films with tunable composition and properties High-rate reactive high-power impulse magnetron sputtering of Ta-O-N films with tunable composition and properties (en)
skos:notation	RIV/49777513:23520/14:43922535!RIV15-GA0-23520___
http://linked.open...avai/riv/aktivita	P
http://linked.open...avai/riv/aktivity	P(GA14-03875S)
http://linked.open...iv/cisloPeriodika	566
http://linked.open...vai/riv/dodaniDat	2015
http://linked.open...aciTvurceVysledku	Houška, Jiří Vlček, Jaroslav Rezek, Jiří Čerstvý, Radomír
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Západočeská univerzita v Plzni / Fakulta aplikovaných věd
http://linked.open...dnocenehoVysledku	19157
http://linked.open...ai/riv/idVysledku	RIV/49777513:23520/14:43922535
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	Hardness; Electrical conductivity; Optical properties; Tunable properties; Ta-O-N; High deposition rates; Reactive HiPIMS (en)
http://linked.open.../riv/klicoveSlovo	Ta-O-N Tunable properties High deposition rates Reactive HiPIMS Electrical conductivity Optical properties Hardness
http://linked.open...odStatuVydavatele	NL - Nizozemsko
http://linked.open...ontrolniKodProRIV	[367AA2589917]
http://linked.open...i/riv/nazevZdroje	Thin Solid Films
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	4 (xsd:int)
http://linked.open...cetTvurcuVysledku	4 (xsd:int)
http://linked.open...vavai/riv/projekt	Nanostructured multifunctional coatings prepared using highly ionized pulsed plasmas
http://linked.open...UplatneniVysledku	2014
http://linked.open...v/svazekPeriodika	2014
http://linked.open...iv/tvurceVysledku	Houška, Jiří Vlček, Jaroslav Rezek, Jiří Čerstvý, Radomír
http://linked.open...ain/vavai/riv/wos	000341057300012
issn	0040-6090
number of pages	8 (xsd:int)
http://bibframe.org/vocab/doi	10.1016/j.tsf.2014.07.033
http://localhost/t...ganizacniJednotka	23520

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