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| Description
| - We systematically investigate and quantify different physical phenomena influencing the deposition rate, aD, of Nb coatings prepared by high power impulse magnetron sputtering (HiPIMS), and propose a straightforward approach for deposition rate enhancement through the control of the magnetron's magnetic field. The magnetic field strength at the target surface, B, of a 50 mm diameter magnetron was controlled by the application of paramagnetic spacers with different thicknesses in between the magnetron surface and the target. We found that lowering B achieved by the application of a 2.8 mm thick spacer led to an increase in aD by a factor of ~4.5 (from 10.6 to 45.2 nm/min) when the discharge was operated at a fixed average pulse target power density (2.5 kW/cm2). However, the ionized fraction of the deposition flux onto the substrate was found to be comparable, despite a large difference in B-dependent discharge characteristics (magnetron voltage and discharge current). We show that the decrease in aD commonly observed in HiPIMS (ranging from 33% to 84% in comparison with dc magnetron sputtering in the presented experiments) is governed by different physical processes, depending on the value of B: for high B, the back-attraction of the target ions towards the target is the dominant effect, while for low B the ion back-attraction, the sub-linear dependence of the sputtering yield on the ion energy, and the variation in material transport effects are all important. Finally, we offer a theoretical background for the observed results, demonstrating that the here-presented conclusions may be applicable to HiPIMS discharges using different metal targets and different inert gases.
- We systematically investigate and quantify different physical phenomena influencing the deposition rate, aD, of Nb coatings prepared by high power impulse magnetron sputtering (HiPIMS), and propose a straightforward approach for deposition rate enhancement through the control of the magnetron's magnetic field. The magnetic field strength at the target surface, B, of a 50 mm diameter magnetron was controlled by the application of paramagnetic spacers with different thicknesses in between the magnetron surface and the target. We found that lowering B achieved by the application of a 2.8 mm thick spacer led to an increase in aD by a factor of ~4.5 (from 10.6 to 45.2 nm/min) when the discharge was operated at a fixed average pulse target power density (2.5 kW/cm2). However, the ionized fraction of the deposition flux onto the substrate was found to be comparable, despite a large difference in B-dependent discharge characteristics (magnetron voltage and discharge current). We show that the decrease in aD commonly observed in HiPIMS (ranging from 33% to 84% in comparison with dc magnetron sputtering in the presented experiments) is governed by different physical processes, depending on the value of B: for high B, the back-attraction of the target ions towards the target is the dominant effect, while for low B the ion back-attraction, the sub-linear dependence of the sputtering yield on the ion energy, and the variation in material transport effects are all important. Finally, we offer a theoretical background for the observed results, demonstrating that the here-presented conclusions may be applicable to HiPIMS discharges using different metal targets and different inert gases. (en)
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| Title
| - Deposition rate enhancement in HiPIMS without compromising the ionized fraction of the deposition flux
- Deposition rate enhancement in HiPIMS without compromising the ionized fraction of the deposition flux (en)
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| skos:prefLabel
| - Deposition rate enhancement in HiPIMS without compromising the ionized fraction of the deposition flux
- Deposition rate enhancement in HiPIMS without compromising the ionized fraction of the deposition flux (en)
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| skos:notation
| - RIV/49777513:23520/13:43918481!RIV14-MSM-23520___
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| http://linked.open...avai/predkladatel
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| http://linked.open...avai/riv/aktivita
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| http://linked.open...avai/riv/aktivity
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| http://linked.open...iv/cisloPeriodika
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| http://linked.open...vai/riv/dodaniDat
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| http://linked.open...aciTvurceVysledku
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| http://linked.open.../riv/druhVysledku
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| http://linked.open...iv/duvernostUdaju
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| http://linked.open...titaPredkladatele
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| http://linked.open...dnocenehoVysledku
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| http://linked.open...ai/riv/idVysledku
| - RIV/49777513:23520/13:43918481
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| http://linked.open...riv/jazykVysledku
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| http://linked.open.../riv/klicovaSlova
| - Nb coatings; plasma; magnetic field; deposition rate enhancement; HiPIMS (en)
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| http://linked.open.../riv/klicoveSlovo
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| http://linked.open...odStatuVydavatele
| - GB - Spojené království Velké Británie a Severního Irska
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| http://linked.open...ontrolniKodProRIV
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| http://linked.open...i/riv/nazevZdroje
| - Journal of Physics D: Applied Physics
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| http://linked.open...in/vavai/riv/obor
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| http://linked.open...ichTvurcuVysledku
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| http://linked.open...cetTvurcuVysledku
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| http://linked.open...UplatneniVysledku
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| http://linked.open...v/svazekPeriodika
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| http://linked.open...iv/tvurceVysledku
| - Čapek, Jiří
- Hála, Matěj
- Klemberg-Sapieha, Jolanta E.
- Martinů, Ludvík
- Zabeida, Oleg
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| http://linked.open...ain/vavai/riv/wos
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| issn
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| number of pages
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| http://bibframe.org/vocab/doi
| - 10.1088/0022-3727/46/20/205205
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| http://localhost/t...ganizacniJednotka
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