About: Pulsed reactive magnetron sputtering of high-temperature Si-B-C-N films with high optical transparency     Goto   Sponge   NotDistinct   Permalink

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Description
  • Multifunctional Si-B-C-N films with exceptionally high thermal stability are becoming increasingly attractive because of their potential applications in coating technologies, and in high-temperature electronics and optoelectronics. In the present work, amorphous Si-B-C-N films were deposited onto SiC and Cu floating substrates using pulsed dc magnetron co-sputtering of a single boron carbide (25%)-silicon (75 %) target in an argon-nitrogen gas mixture. High-quality defect-free films with smooth surfaces (average roughness of 4 nm) were produced. The films exhibited a hardness of 22 GPa, an effective Young's modulus of 170 GPa and an elastic recovery of 75%. The oxidation resistance of the Si-B-C-N films in air was found to be very high up to 1600 °C. Annealing of the as-deposited films in He to 1400 °C led to a slight decrease in the refractive index from 1.92 to 1.91 and to an increase in the extinction coefficient from 0.0003 to 0.003 (both at the wavelength of 550 nm).
  • Multifunctional Si-B-C-N films with exceptionally high thermal stability are becoming increasingly attractive because of their potential applications in coating technologies, and in high-temperature electronics and optoelectronics. In the present work, amorphous Si-B-C-N films were deposited onto SiC and Cu floating substrates using pulsed dc magnetron co-sputtering of a single boron carbide (25%)-silicon (75 %) target in an argon-nitrogen gas mixture. High-quality defect-free films with smooth surfaces (average roughness of 4 nm) were produced. The films exhibited a hardness of 22 GPa, an effective Young's modulus of 170 GPa and an elastic recovery of 75%. The oxidation resistance of the Si-B-C-N films in air was found to be very high up to 1600 °C. Annealing of the as-deposited films in He to 1400 °C led to a slight decrease in the refractive index from 1.92 to 1.91 and to an increase in the extinction coefficient from 0.0003 to 0.003 (both at the wavelength of 550 nm). (en)
Title
  • Pulsed reactive magnetron sputtering of high-temperature Si-B-C-N films with high optical transparency
  • Pulsed reactive magnetron sputtering of high-temperature Si-B-C-N films with high optical transparency (en)
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  • Pulsed reactive magnetron sputtering of high-temperature Si-B-C-N films with high optical transparency
  • Pulsed reactive magnetron sputtering of high-temperature Si-B-C-N films with high optical transparency (en)
skos:notation
  • RIV/49777513:23520/13:43918474!RIV14-GA0-23520___
http://linked.open...avai/predkladatel
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(GAP108/12/0393)
http://linked.open...iv/cisloPeriodika
  • 1
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
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  • 101030
http://linked.open...ai/riv/idVysledku
  • RIV/49777513:23520/13:43918474
http://linked.open...riv/jazykVysledku
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  • Defect-free surfaces; High optical transparency; High thermal stability; Pulsed magnetron sputtering; Si-B-C-N films (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • US - Spojené státy americké
http://linked.open...ontrolniKodProRIV
  • [C294726CFA67]
http://linked.open...i/riv/nazevZdroje
  • Surface & Coatings Technology
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
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http://linked.open...vavai/riv/projekt
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http://linked.open...v/svazekPeriodika
  • 226
http://linked.open...iv/tvurceVysledku
  • Houška, Jiří
  • Zeman, Petr
  • Vlček, Jaroslav
  • Calta, Pavel
  • Čerstvý, Radomír
  • Steidl, Petr
  • Kohout, Jiří
http://linked.open...ain/vavai/riv/wos
  • 000320415400006
issn
  • 0257-8972
number of pages
http://bibframe.org/vocab/doi
  • 10.1016/j.surfcoat.2013.03.033
http://localhost/t...ganizacniJednotka
  • 23520
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