About: Electrical resistivity of Cu films sputtered by pulsed dc magnetron     Goto   Sponge   NotDistinct   Permalink

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Description
  • The experimental device consists of a stainless steel vacuum chamber with a planar circular unbalanced magnetron with a target 100 mm of Cu in diameter which is supplied by a pulsed dc power supply Rubig MP-120 with maximum pulse voltage 1000 V, the maximum pulse current 120 A, the maximum pulse power 120 kW and the average power 50 kW. The repetition frequency can be varied between 0.5 and 50 kHz.
  • The experimental device consists of a stainless steel vacuum chamber with a planar circular unbalanced magnetron with a target 100 mm of Cu in diameter which is supplied by a pulsed dc power supply Rubig MP-120 with maximum pulse voltage 1000 V, the maximum pulse current 120 A, the maximum pulse power 120 kW and the average power 50 kW. The repetition frequency can be varied between 0.5 and 50 kHz. (en)
Title
  • Electrical resistivity of Cu films sputtered by pulsed dc magnetron
  • Electrical resistivity of Cu films sputtered by pulsed dc magnetron (en)
skos:prefLabel
  • Electrical resistivity of Cu films sputtered by pulsed dc magnetron
  • Electrical resistivity of Cu films sputtered by pulsed dc magnetron (en)
skos:notation
  • RIV/49777513:23520/03:00000106!RIV/2004/MSM/235204/N
http://linked.open.../vavai/riv/strany
  • 122-123
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(ME 203), Z(MSM 235200002)
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 605607
http://linked.open...ai/riv/idVysledku
  • RIV/49777513:23520/03:00000106
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • magnetron sputtering;electrical resistivity;thin films (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...ontrolniKodProRIV
  • [0800C979E418]
http://linked.open...v/mistoKonaniAkce
  • Liptovský Mikuláš
http://linked.open...i/riv/mistoVydani
  • Liptovský Mikuláš
http://linked.open...i/riv/nazevZdroje
  • Proceedings of the XIVth Symposium on Application of Plasma Processes
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...ocetUcastnikuAkce
http://linked.open...nichUcastnikuAkce
http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...iv/tvurceVysledku
  • Musil, Jindřich
  • Leština, Jan
http://linked.open...vavai/riv/typAkce
http://linked.open.../riv/zahajeniAkce
http://linked.open...n/vavai/riv/zamer
number of pages
http://purl.org/ne...btex#hasPublisher
  • Military Academy
https://schema.org/isbn
  • 80-8040-195-0
http://localhost/t...ganizacniJednotka
  • 23520
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