| Attributes | Values |
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| rdf:type
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| Description
| - Vývoj plazma chemických metod přípravy tenkých vrstev je stimulován hlavně potřebou snížit teplotu během procesu tvorby vrstvy s použitím klasické chemické syntézy , tj. CVD (Chemical Vapour Deposition). Tato vlastnost je dána fyzikálně chemckými metodami , když probíhá chemická reakce v ionizované atmosféře, tj. plazmě. Tyto metody vužívají plazmu pro tvorbu vrstvy PECVD metodami (Plasma Enhanced Chemical Vapour Deposition). V rámci naší práce byla PECVD metoda použita pro povlakování polykarbonátového substrátu SiOx vrstvou, která složí jako otěruvzdorná vrstva. SiOx vrstva byla zvolena pro její optickou transparentnost a dostatečnou otěruvzdornost. Tloušťka vyloučených vrstev leží mezi 2 _m a 4 _m. Povlakované i nepovlakované polykarbonáty byly zkoušeny na otěruvzdornost s použitím zařízení Elcometer 1720 e (Abrasion, Scrubbing and Washability Tester). (cs)
- The development of plazma-chemical methods of production thin layers is stimulated mainlyby the urgent need to decrease temperature during the process of layerproduction usingclassical chemical synthesis, ie. the CVD (Chemical Vapour Deposition). This feature isprovided by physical-chemical methods, when chemical reactions také place in ionizedatmosphere, ie. in plasma. Therefore are these methods utilising plasma for layer productioncalled PECVD methods (Plasma Enhanced Chemical Vapour Deposition). In frame of ourwork the PECVD method has been utilised for coating the polycarbonate substrate by SiOxlayer, that serves as a wear protection layer. SiOx layer has been chosen for its opticaltransparency and sufficient wear resistance. The thickness of deposited layers lies between2 _m and 4 _m.Coated as well as non-coated polycarbonate has been tested for wear resistance using theElcometer 1720 device (Abrasion, Scrubbing and Washability Tester).
- The development of plazma-chemical methods of production thin layers is stimulated mainlyby the urgent need to decrease temperature during the process of layerproduction usingclassical chemical synthesis, ie. the CVD (Chemical Vapour Deposition). This feature isprovided by physical-chemical methods, when chemical reactions také place in ionizedatmosphere, ie. in plasma. Therefore are these methods utilising plasma for layer productioncalled PECVD methods (Plasma Enhanced Chemical Vapour Deposition). In frame of ourwork the PECVD method has been utilised for coating the polycarbonate substrate by SiOxlayer, that serves as a wear protection layer. SiOx layer has been chosen for its opticaltransparency and sufficient wear resistance. The thickness of deposited layers lies between2 _m and 4 _m.Coated as well as non-coated polycarbonate has been tested for wear resistance using theElcometer 1720 device (Abrasion, Scrubbing and Washability Tester). (en)
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| Title
| - Deposition of wear resistant SiOx layers on polycarbonate using the PECVD technology
- Deposition of wear resistant SiOx layers on polycarbonate using the PECVD technology (en)
- Vylučování otěruvzdorných vrstev SiOx na polykarbonátu s použitím PECVD technologie. (cs)
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| skos:prefLabel
| - Deposition of wear resistant SiOx layers on polycarbonate using the PECVD technology
- Deposition of wear resistant SiOx layers on polycarbonate using the PECVD technology (en)
- Vylučování otěruvzdorných vrstev SiOx na polykarbonátu s použitím PECVD technologie. (cs)
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| skos:notation
| - RIV/46747885:24210/07:@KMT0109!RIV08-MSM-24210___
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| http://linked.open.../vavai/riv/strany
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| http://linked.open...avai/riv/aktivita
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| http://linked.open...avai/riv/aktivity
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| http://linked.open...vai/riv/dodaniDat
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| http://linked.open...aciTvurceVysledku
| |
| http://linked.open.../riv/druhVysledku
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| http://linked.open...iv/duvernostUdaju
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| http://linked.open...titaPredkladatele
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| http://linked.open...dnocenehoVysledku
| |
| http://linked.open...ai/riv/idVysledku
| - RIV/46747885:24210/07:@KMT0109
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| http://linked.open...riv/jazykVysledku
| |
| http://linked.open.../riv/klicovaSlova
| - PEVCD, SiOx, polycarbonate, wear resistance (en)
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| http://linked.open.../riv/klicoveSlovo
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| http://linked.open...ontrolniKodProRIV
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| http://linked.open...v/mistoKonaniAkce
| |
| http://linked.open...i/riv/mistoVydani
| |
| http://linked.open...i/riv/nazevZdroje
| - International Conference Vacuum and Plasma Surface Engineering
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| http://linked.open...in/vavai/riv/obor
| |
| http://linked.open...ichTvurcuVysledku
| |
| http://linked.open...cetTvurcuVysledku
| |
| http://linked.open...UplatneniVysledku
| |
| http://linked.open...iv/tvurceVysledku
| - Špatenka, Petr
- Cerman, Jiří
|
| http://linked.open...vavai/riv/typAkce
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| http://linked.open.../riv/zahajeniAkce
| |
| http://linked.open...n/vavai/riv/zamer
| |
| number of pages
| |
| http://purl.org/ne...btex#hasPublisher
| - Technická univerzita v Liberci
|
| https://schema.org/isbn
| |
| http://localhost/t...ganizacniJednotka
| |
| is http://linked.open...avai/riv/vysledek
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