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Description
  • Tenké filmy TiO2 byly připraveny plazmaticky podporovanou chemickou depozicí z plynné fáze (PECVD). Jako pracovní plyn byla použita směs isopropoxidu titaničitého s kyslíkem. Filmy byly vyloučeny na skleněných a křemíkových substrátech. Byla zkoumána fotokatalytická aktivita a fotoindukovaná hydrofilita filmů v závislosti na experimentálních podmínkách. Filmy byly charakterizovány SEM, AFM, rentgenovou difrakcí (XRD), Rutherfordovou spektroskopií zpětným rozptylem (RBS), a rtg fotoelektronovou spektroskopií (XPS). Fotokatalytické vlastnosti filmŮ BYLY SILNĚ ovlivněny iontovým bombardováním a vylučiovací teplotou. Film s anatasovou krystalovou strukturou a s fotokatalytickými účinky byl nanesen při120 °C nízkoenergetickým iontovým bombardováním. (cs)
  • TiO2 thin films were prepared by Plasma Enhanced Chemical Vapor Deposition (PECVD) technique. Titanium (IV) isopropoxide mixture with oxygen was used as the working gas. Films were deposited on glass and silicon substrates. Photocatalytic activity and photoinduced hydrophilicity of the films were investigated in dependence on experimental conditions. The films were characterized by scanning electron microscope (SEM), atomic force microscope (AFM), X-ray diffraction (XRD), Rutherford backscattering spectroscopy (RBS), and X-ray photoelectron spectroscopy (XPS). Photocatalytic properties of the films were strongly influenced by ion bombardment and deposition temperature. The film with anatase crystalline structure and with high photocatalytic activity was deposited at 120 8C under low energy ion bombardment
  • TiO2 thin films were prepared by Plasma Enhanced Chemical Vapor Deposition (PECVD) technique. Titanium (IV) isopropoxide mixture with oxygen was used as the working gas. Films were deposited on glass and silicon substrates. Photocatalytic activity and photoinduced hydrophilicity of the films were investigated in dependence on experimental conditions. The films were characterized by scanning electron microscope (SEM), atomic force microscope (AFM), X-ray diffraction (XRD), Rutherford backscattering spectroscopy (RBS), and X-ray photoelectron spectroscopy (XPS). Photocatalytic properties of the films were strongly influenced by ion bombardment and deposition temperature. The film with anatase crystalline structure and with high photocatalytic activity was deposited at 120 8C under low energy ion bombardment (en)
Title
  • Photocatalytic TiO2 thin Film Prepared by PE CVD at low Temperature.
  • Photocatalytic TiO2 thin Film Prepared by PE CVD at low Temperature. (en)
  • Fotokatalytická tenká vrstva TiO2 připravená PE CVD při nízké teplotě. (cs)
skos:prefLabel
  • Photocatalytic TiO2 thin Film Prepared by PE CVD at low Temperature.
  • Photocatalytic TiO2 thin Film Prepared by PE CVD at low Temperature. (en)
  • Fotokatalytická tenká vrstva TiO2 připravená PE CVD při nízké teplotě. (cs)
skos:notation
  • RIV/46747885:24210/07:@KMT0085!RIV08-MSM-24210___
http://linked.open.../vavai/riv/strany
  • S350-S355
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  • P(1M0577)
http://linked.open...iv/cisloPeriodika
  • 4
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http://linked.open...aciTvurceVysledku
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  • 441233
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  • RIV/46747885:24210/07:@KMT0085
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  • %22TiO2; PECVD; photocatalytic activity; XRD; SEM; AFM; RBS; XPS%22 (en)
http://linked.open.../riv/klicoveSlovo
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  • GB - Spojené království Velké Británie a Severního Irska
http://linked.open...ontrolniKodProRIV
  • [0AFBBA83D093]
http://linked.open...i/riv/nazevZdroje
  • Plasma Processes and Polymers
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
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http://linked.open...vavai/riv/projekt
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http://linked.open...v/svazekPeriodika
  • 4
http://linked.open...iv/tvurceVysledku
  • Hájková, Pavlína
  • Macková, Anna
  • Horáková, Marta
  • Špatenka, Petr
  • Kolouch, Aleš
  • Houdková, J.
  • Hucek, S.
issn
  • 1612-8850
number of pages
http://localhost/t...ganizacniJednotka
  • 24210
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