About: A single target RF magnetron co-sputtered iron doped tin oxide films with pillars

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About: A single target RF magnetron co-sputtered iron doped tin oxide films with pillars Goto Sponge NotDistinct Permalink

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Attributes	Values
rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
rdfs:seeAlso	http://www.sciencedirect.com/science?_ob=MiamiImageURL&_cid=271582&_user=640945&_pii=S0042207X1100008X&_check=y&_origin=&_coverDate=25-Feb-2011&view=c&wchp=dGLzVlV-zSkzV&md5=895382bc98fe0230ffda9edfc085b6d9/1-s2.0-S0042207X1100008X-main.pdf
Description	The SnO2 gas sensors and catalytic surfaces are produced by different techniques with a wide range of dopants improving their selectivity and sensitivities. The surface topology is important because the active surface area can be enlarged dramatically by employing nanostructures. Many reported techniques for the tin oxide nanostructures preparation require fine powders or liquid precursors together with high temperatures above 500 degrees C. But the nanostructures can be formed by the RF off-axis magnetron sputtering technique at room temperature from a bulk target. The single target co-sputtering of SnO2 target with Fe inset was used to deposit SnO2 film doped by iron. The 400 nm diameter pillars were successfully deposited in controllable density on polished Si substrates at low pressure 0.3 Pa of argon and oxygen gas mixture. The pillars were not formatted at the beginning of deposition process but certain SnO2 film was required. The surface around the pillars was flat without any significant texture. The iron in form of the iron oxide was found to be the doping in deposited coatings when the stannic oxide was sub-stoichiometry with oxygen vacancies. The SnO2 gas sensors and catalytic surfaces are produced by different techniques with a wide range of dopants improving their selectivity and sensitivities. The surface topology is important because the active surface area can be enlarged dramatically by employing nanostructures. Many reported techniques for the tin oxide nanostructures preparation require fine powders or liquid precursors together with high temperatures above 500 degrees C. But the nanostructures can be formed by the RF off-axis magnetron sputtering technique at room temperature from a bulk target. The single target co-sputtering of SnO2 target with Fe inset was used to deposit SnO2 film doped by iron. The 400 nm diameter pillars were successfully deposited in controllable density on polished Si substrates at low pressure 0.3 Pa of argon and oxygen gas mixture. The pillars were not formatted at the beginning of deposition process but certain SnO2 film was required. The surface around the pillars was flat without any significant texture. The iron in form of the iron oxide was found to be the doping in deposited coatings when the stannic oxide was sub-stoichiometry with oxygen vacancies. (en)
Title	A single target RF magnetron co-sputtered iron doped tin oxide films with pillars A single target RF magnetron co-sputtered iron doped tin oxide films with pillars (en)
skos:prefLabel	A single target RF magnetron co-sputtered iron doped tin oxide films with pillars A single target RF magnetron co-sputtered iron doped tin oxide films with pillars (en)
skos:notation	RIV/44555601:13440/11:10005060!RIV12-AV0-13440___
http://linked.open...avai/predkladatel	Přírodovědecká fakulta
http://linked.open...avai/riv/aktivita	P
http://linked.open...avai/riv/aktivity	P(KAN400720701), P(LC06041)
http://linked.open...iv/cisloPeriodika	9
http://linked.open...vai/riv/dodaniDat	2012
http://linked.open...aciTvurceVysledku	Kormunda, Martin Pavlík, Jaroslav
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Univerzita Jana Evangelisty Purkyně v Ústí nad Labem / Přírodovědecká fakulta
http://linked.open...dnocenehoVysledku	184155
http://linked.open...ai/riv/idVysledku	RIV/44555601:13440/11:10005060
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	Nanostructures; Stannic oxide; Off-axis deposition; Magnetron co-sputtering (en)
http://linked.open.../riv/klicoveSlovo	Magnetron co-sputtering Nanostructures Off-axis deposition Stannic oxide
http://linked.open...odStatuVydavatele	GB - Spojené království Velké Británie a Severního Irska
http://linked.open...ontrolniKodProRIV	[45AA6408AC1A]
http://linked.open...i/riv/nazevZdroje	Vacuum
http://linked.open...in/vavai/riv/obor	BG
http://linked.open...ichTvurcuVysledku	2 (xsd:int)
http://linked.open...cetTvurcuVysledku	2 (xsd:int)
http://linked.open...vavai/riv/projekt	Hierarchic nanosystems for microelektronics Preparation, modification and characterization of materials by energetic radiation.
http://linked.open...UplatneniVysledku	2011
http://linked.open...v/svazekPeriodika	85
http://linked.open...iv/tvurceVysledku	Kormunda, Martin Pavlík, Jaroslav
http://linked.open...ain/vavai/riv/wos	000289181700005
issn	0042-207X
number of pages	4 (xsd:int)
http://bibframe.org/vocab/doi	10.1016/j.vacuum.2010.12.013
http://localhost/t...ganizacniJednotka	13440
is http://linked.open...avai/riv/vysledek of	A single target RF magnetron co-sputtered iron doped tin oxide films with pillars A single target RF magnetron co-sputtered iron doped tin oxide films with pillars

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