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  • Metal particle implantation into glasses has promising properties for application in optical devices. These properties depend on the size, shape, density and spatial distribution of metal particles [1]. Heavy-ion implantation of silica glasses is an efficient method of fabrication of the metal-nanoparticles composites that are promising for ultra-fast optical devices [2]. Implantation of Ag and Er ions into silicate glass was studied in this work. The energies of the implanted Ag and Er ions were 330 keV and used implantation fluence of ions was 1.0 x 1016 ions.cm-2. The depth distribution and diffusion profiles of implanted Ag and Er were investigated using X-ray photoelectron spectroscopy (XPS) and the Rutherford Backscattering Spectrometry (RBS) with the 2.0 MeV He+ ions, the incoming angle was 0° while the scattering angle was 170°. XPS depth profiles of the different elements were carried out by cycles of Ar+ sputtering at energy of 2.5 keV. Owing to surface charging, samples showed a sh
  • Metal particle implantation into glasses has promising properties for application in optical devices. These properties depend on the size, shape, density and spatial distribution of metal particles [1]. Heavy-ion implantation of silica glasses is an efficient method of fabrication of the metal-nanoparticles composites that are promising for ultra-fast optical devices [2]. Implantation of Ag and Er ions into silicate glass was studied in this work. The energies of the implanted Ag and Er ions were 330 keV and used implantation fluence of ions was 1.0 x 1016 ions.cm-2. The depth distribution and diffusion profiles of implanted Ag and Er were investigated using X-ray photoelectron spectroscopy (XPS) and the Rutherford Backscattering Spectrometry (RBS) with the 2.0 MeV He+ ions, the incoming angle was 0° while the scattering angle was 170°. XPS depth profiles of the different elements were carried out by cycles of Ar+ sputtering at energy of 2.5 keV. Owing to surface charging, samples showed a sh (en)
Title
  • RBS and XPS Measurements of Ag and Er Implantation into the Silica Glass
  • RBS and XPS Measurements of Ag and Er Implantation into the Silica Glass (en)
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  • RBS and XPS Measurements of Ag and Er Implantation into the Silica Glass
  • RBS and XPS Measurements of Ag and Er Implantation into the Silica Glass (en)
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  • RIV/44555601:13440/09:00004905!RIV10-MSM-13440___
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  • P(LC06041)
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  • 338169
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  • RIV/44555601:13440/09:00004905
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  • metal nanoparticles; glass; concentration depth profile; XPS; RBS (en)
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  • [2FF4D3B6DC1B]
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  • Liptovský Ján, Slovakia
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  • Bratislava, Slovakia
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  • Book of Contributed Papers of 17th Symposium on Application of Plasma Processe - Visegrad Workshop on Research of Plasma Physics,
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  • Kormunda, Martin
  • Macková, Anna
  • Malinský, Petr
  • Nekvindová, P.
  • Švecová, B.
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  • Comenius University in Bratislava; Humboldt-Club Slovakia, Bratislava
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  • 978-80-89186-46-4
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  • 13440
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