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Description
| - V této práci byly studovány povrchové a strukturální vlastnosti tenkých vrstev SnO2 připravených plazmovou oxidací tenkých cínových vrstev a RF, DC reaktivním naprašováním cínu ve směsi kyslíku a argonem. (cs)
- Thin films of oxide materials have high potential for device applications. Development of gas sensors in last few years has shown an important interest in thin tin oxide films. The SnO2 is one of the most widely used materials for gas sensor applications due to their good performance for a detection of oxidable gases. When SnO2 layers are used in gas sensors, some features can depend on many layer parameters as thickness, cluster size, roughness, etc. Since the properties of the material are strongly dependent on the procedure of preparation, different techniques have been employed to obtain SnO2 thin films [1, 2, 3, 4]. In this work we have studied surface properties and tructure of SnO2 thin films prepared both by plasma oxidation of the thin tin films [5] and by RF or DC magnetron reactive sputtering of tin target in oxygen + argon mixture tmosphere. Tin dioxide films were prepared by RF sputtering of SnO2 target using argon or oxygen as working gas, too.
- Thin films of oxide materials have high potential for device applications. Development of gas sensors in last few years has shown an important interest in thin tin oxide films. The SnO2 is one of the most widely used materials for gas sensor applications due to their good performance for a detection of oxidable gases. When SnO2 layers are used in gas sensors, some features can depend on many layer parameters as thickness, cluster size, roughness, etc. Since the properties of the material are strongly dependent on the procedure of preparation, different techniques have been employed to obtain SnO2 thin films [1, 2, 3, 4]. In this work we have studied surface properties and tructure of SnO2 thin films prepared both by plasma oxidation of the thin tin films [5] and by RF or DC magnetron reactive sputtering of tin target in oxygen + argon mixture tmosphere. Tin dioxide films were prepared by RF sputtering of SnO2 target using argon or oxygen as working gas, too. (en)
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Title
| - Study of SnO2 Thin Films Prepared by Plasma Assisted Deposition Techniques
- Studium tenkých vrstev SnO2 připravených depozičními technikami za asistence plazmatu (cs)
- Study of SnO2 Thin Films Prepared by Plasma Assisted Deposition Techniques (en)
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skos:prefLabel
| - Study of SnO2 Thin Films Prepared by Plasma Assisted Deposition Techniques
- Studium tenkých vrstev SnO2 připravených depozičními technikami za asistence plazmatu (cs)
- Study of SnO2 Thin Films Prepared by Plasma Assisted Deposition Techniques (en)
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skos:notation
| - RIV/44555601:13440/07:00003909!RIV08-MSM-13440___
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http://linked.open.../vavai/riv/strany
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http://linked.open...avai/riv/aktivita
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http://linked.open...avai/riv/aktivity
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http://linked.open...vai/riv/dodaniDat
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http://linked.open...aciTvurceVysledku
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http://linked.open.../riv/druhVysledku
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http://linked.open...iv/duvernostUdaju
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http://linked.open...titaPredkladatele
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http://linked.open...dnocenehoVysledku
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http://linked.open...ai/riv/idVysledku
| - RIV/44555601:13440/07:00003909
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http://linked.open...riv/jazykVysledku
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http://linked.open.../riv/klicovaSlova
| - SnO2; sensor; plasma assisted deposition techniques (en)
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http://linked.open.../riv/klicoveSlovo
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http://linked.open...ontrolniKodProRIV
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http://linked.open...i/riv/mistoVydani
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http://linked.open...i/riv/nazevZdroje
| - Proceedings of 16th-Symposium on Application of Plasma Processes
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http://linked.open...in/vavai/riv/obor
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http://linked.open...ichTvurcuVysledku
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http://linked.open...cetTvurcuVysledku
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http://linked.open...vavai/riv/projekt
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http://linked.open...UplatneniVysledku
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http://linked.open...iv/tvurceVysledku
| - Matoušek, Jindřich
- Pavlík, Jaroslav
- Strýhal, Zdeněk
- Vagner, T.
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number of pages
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http://purl.org/ne...btex#hasPublisher
| - Univerzita Komenského v Bratislave. Vydavateľstvo
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https://schema.org/isbn
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http://localhost/t...ganizacniJednotka
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is http://linked.open...avai/riv/vysledek
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