About: Physical Processes During Plasma Oxidation of Aluminium

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An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Plasma oxidation, utilising highly activated oxygen or oxygen/argon plasma, is one of the low temperature technigues used to grow of dielectric films on metal and semiconductor surfaces. The paper deals with a comparative study of plasma characteristics and thin oxide film properties. The main diagnostic technigues applied in order to determine plasma parameters (QMS) diagnostics. The composition and the atomic surface density of prepared samples were studied by conventional Rutherford elastic back-scattering (RBS). Investigation of morphology of the sample surfaces and surface roughness of the alumina thin film were performed by Atomic Force Microscopy (AFM). The experimental technigues are combined with computer experiments in order to achieve betterinsight into the problems solved. The computer experiment of the oxide film growth is based on a model of both the plasma-solid interactions including basic processes on the substrate and the processes in the growing oxide films. Plasma oxidation, utilising highly activated oxygen or oxygen/argon plasma, is one of the low temperature technigues used to grow of dielectric films on metal and semiconductor surfaces. The paper deals with a comparative study of plasma characteristics and thin oxide film properties. The main diagnostic technigues applied in order to determine plasma parameters (QMS) diagnostics. The composition and the atomic surface density of prepared samples were studied by conventional Rutherford elastic back-scattering (RBS). Investigation of morphology of the sample surfaces and surface roughness of the alumina thin film were performed by Atomic Force Microscopy (AFM). The experimental technigues are combined with computer experiments in order to achieve betterinsight into the problems solved. The computer experiment of the oxide film growth is based on a model of both the plasma-solid interactions including basic processes on the substrate and the processes in the growing oxide films. (en)
Title	Physical Processes During Plasma Oxidation of Aluminium Physical Processes During Plasma Oxidation of Aluminium (en)
skos:prefLabel	Physical Processes During Plasma Oxidation of Aluminium Physical Processes During Plasma Oxidation of Aluminium (en)
skos:notation	RIV/44555601:13430/01:00001438!RIV/2002/MSM/134302/N
http://linked.open.../vavai/riv/strany	85-87
http://linked.open...avai/riv/aktivita	P Z
http://linked.open...avai/riv/aktivity	P(OC 527.50), P(OK 401), P(OK 409), Z(MSM 113200002), Z(MSM 134300001)
http://linked.open...iv/cisloPeriodika	300
http://linked.open...vai/riv/dodaniDat	2002
http://linked.open...aciTvurceVysledku	Vicher, Miroslav Pavlík, Jaroslav Hrach, Rudolf Macková, Anna Novák, Stanislav Strýhal, Zdeněk
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Univerzita Jana Evangelisty Purkyně v Ústí nad Labem / Pedagogická fakulta
http://linked.open...dnocenehoVysledku	691163
http://linked.open...ai/riv/idVysledku	RIV/44555601:13430/01:00001438
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	Plasma oxidation, OES, QMS,RBS, AFM, Al2O3 (en)
http://linked.open.../riv/klicoveSlovo	OES Al2O3 QMS Plasma oxidation AFM RBS
http://linked.open...odStatuVydavatele	FR - Francouzská republika
http://linked.open...ontrolniKodProRIV	[E01CAF873F22]
http://linked.open...i/riv/nazevZdroje	Le Vide: science, technigue et application
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	6 (xsd:int)
http://linked.open...cetTvurcuVysledku	7 (xsd:int)
http://linked.open...ocetUcastnikuAkce	0 (xsd:int)
http://linked.open...nichUcastnikuAkce	0 (xsd:int)
http://linked.open...vavai/riv/projekt	http://linked.opendata.cz/resource/domain/vavai/projekt/OK%20409 http://linked.opendata.cz/resource/domain/vavai/projekt/OK%20401 http://linked.opendata.cz/resource/domain/vavai/projekt/OC%20527.50
http://linked.open...UplatneniVysledku	2001
http://linked.open...v/svazekPeriodika	56
http://linked.open...iv/tvurceVysledku	Hrach, Rudolf Macková, Anna Pavlík, Jaroslav Novák, Stanislav Strýhal, Zdeněk Vicher, Miroslav Peřina, Václav
http://linked.open...n/vavai/riv/zamer	http://linked.opendata.cz/resource/domain/vavai/zamer/MSM%20113200002 http://linked.opendata.cz/resource/domain/vavai/zamer/MSM%20134300001
issn	1266-0167
number of pages	3 (xsd:int)
http://localhost/t...ganizacniJednotka	13430

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