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  • Plasma-polymerized films of vinyltriethoxysilane were prepared by plasma-enhanced chemical vapor deposition using an RF (13.56 MHz) helical coupling plasma system operated in a pulsed regime. Thin films deposited under the same deposition conditions but with different thicknesses (9.5 nm - 10.5 micron) were analyzed with respect to mechanical, optical, and chemical properties. All the films exhibited a layered structure. The overlayer at the film surface with a thickness (0.9 - 34 nm) dependent on the sample thickness was revealed by AFM, nanoindentation, and ellipsometry. A gradient behavior of the refractive index and the Young's modulus within the overlayer was related to the surface morphology of the films. A gradient interlayer at the substrate was also discussed.
  • Plasma-polymerized films of vinyltriethoxysilane were prepared by plasma-enhanced chemical vapor deposition using an RF (13.56 MHz) helical coupling plasma system operated in a pulsed regime. Thin films deposited under the same deposition conditions but with different thicknesses (9.5 nm - 10.5 micron) were analyzed with respect to mechanical, optical, and chemical properties. All the films exhibited a layered structure. The overlayer at the film surface with a thickness (0.9 - 34 nm) dependent on the sample thickness was revealed by AFM, nanoindentation, and ellipsometry. A gradient behavior of the refractive index and the Young's modulus within the overlayer was related to the surface morphology of the films. A gradient interlayer at the substrate was also discussed. (en)
Title
  • Correlation between mechanical, optical and chemical properties of thin films deposited by PECVD
  • Correlation between mechanical, optical and chemical properties of thin films deposited by PECVD (en)
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  • Correlation between mechanical, optical and chemical properties of thin films deposited by PECVD
  • Correlation between mechanical, optical and chemical properties of thin films deposited by PECVD (en)
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  • RIV/00216305:26310/08:PU77699!RIV10-MSM-26310___
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(1P05OC087), P(GA104/06/0437), P(KAN101120701)
http://linked.open...iv/cisloPeriodika
  • 22
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
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  • 361384
http://linked.open...ai/riv/idVysledku
  • RIV/00216305:26310/08:PU77699
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • Ellipsometry, Fourier transform infrared spectroscopy, Photoelectron spectroscopy, [C] PACVD, [X] Plasma polymerization (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • CZ - Česká republika
http://linked.open...ontrolniKodProRIV
  • [013136B2E3F4]
http://linked.open...i/riv/nazevZdroje
  • Surface and Coatings Technology
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
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http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 202
http://linked.open...iv/tvurceVysledku
  • Studýnka, Jan
  • Čech, Vladimír
  • Zemek, Josef
  • Mistrík, Jan
  • Čechalová, Božena
issn
  • 0257-8972
number of pages
http://localhost/t...ganizacniJednotka
  • 26310
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