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  • Microwave electron cyclotron resonance plasma afterglow chemical vapour deposition (MW ECR PA CVD) and radio frequency plasma enhanced CVD (RF PE CVD) of plasma-poly(methylphenylsilane) (p-PMPS) were examined according to plasma composition and resultingthin film properties. Direct mass spectrometry monitoring and gas chromatography and mass spectroscopy (GC MS) of cold-trapped plasma products were used. Deposited samples were measured mainly on luminescence. The low pressure MW ECR plasma creates spec cies for layer growth by a smaller average number of inelastic collisions per origin of monomer molecule. The exploitation of monomer reaches 23% in comparison with RF plasma and the deposition rate is larger in comparison with RF plasma . The inelasticcollision rate is primarily more important for growing layers than the power introduced into plasma. The luminescence spectra of both MW and RF samples are compared.
  • Microwave electron cyclotron resonance plasma afterglow chemical vapour deposition (MW ECR PA CVD) and radio frequency plasma enhanced CVD (RF PE CVD) of plasma-poly(methylphenylsilane) (p-PMPS) were examined according to plasma composition and resultingthin film properties. Direct mass spectrometry monitoring and gas chromatography and mass spectroscopy (GC MS) of cold-trapped plasma products were used. Deposited samples were measured mainly on luminescence. The low pressure MW ECR plasma creates spec cies for layer growth by a smaller average number of inelastic collisions per origin of monomer molecule. The exploitation of monomer reaches 23% in comparison with RF plasma and the deposition rate is larger in comparison with RF plasma . The inelasticcollision rate is primarily more important for growing layers than the power introduced into plasma. The luminescence spectra of both MW and RF samples are compared. (en)
  • Předmětem publikace je plazmatická polymerace metylfenylsilánu v radifrekvenčním a mikrovlném výboji (cs)
Title
  • Plasma polymerisation of methylphenylsilane
  • Plasma polymerisation of methylphenylsilane (en)
  • Plazmatická polymerace metylfenylsilánu (cs)
skos:prefLabel
  • Plasma polymerisation of methylphenylsilane
  • Plasma polymerisation of methylphenylsilane (en)
  • Plazmatická polymerace metylfenylsilánu (cs)
skos:notation
  • RIV/00216305:26310/05:PU52971!RIV06-MSM-26310___
http://linked.open.../vavai/riv/strany
  • 486-489
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(1P05ME734), P(GP203/03/D133), Z(MSM0021630501), Z(MSM7088352101)
http://linked.open...iv/cisloPeriodika
  • 1-4
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 536181
http://linked.open...ai/riv/idVysledku
  • RIV/00216305:26310/05:PU52971
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • Polysilane; PMPS; Plasma deposition; Mass spectroscopy (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • CZ - Česká republika
http://linked.open...ontrolniKodProRIV
  • [B9997018EB2E]
http://linked.open...i/riv/nazevZdroje
  • Surface and Coatings Technology
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 200
http://linked.open...iv/tvurceVysledku
  • Kuřitka, Ivo
  • Salyk, Ota
  • Weiter, Martin
  • Broža, Pavel
  • Pryček, Jiří
  • Dokoupil, Norbert
  • Herrmann, Radim
http://linked.open...n/vavai/riv/zamer
issn
  • 0257-8972
number of pages
http://localhost/t...ganizacniJednotka
  • 26310
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