About: RF-power-controlled Young's modulus of plasma-polymerized organosilicon films     Goto   Sponge   NotDistinct   Permalink

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Description
  • Elastic thin films of vinyltriethoxysilane were prepared by plasma-enhanced chemical vapor deposition using an RF (13.56 MHz) helical coupling plasma system. An effective power density ranging from 8 . 10-4 to 0.3 W cm-3 was used to control the Young's modulus of films to a range of 3.7 - 11.3 GPa. The modulus decreased slightly with the film thickness varying from 80 nm to 1.5 microns for films prepared under the same deposition conditions. The hardness of films (0.7 - 2.1 GPa) was proportional to the Young's modulus with a relatively high ratio of 0.185 associated with a higher mean compressive elastic strain with respect to other groups of plasma polymers (0.059 - 0.115). Thin films exhibited an abrupt increase in hardness at the film surface relat ed to post-deposition oxidation.
  • Elastic thin films of vinyltriethoxysilane were prepared by plasma-enhanced chemical vapor deposition using an RF (13.56 MHz) helical coupling plasma system. An effective power density ranging from 8 . 10-4 to 0.3 W cm-3 was used to control the Young's modulus of films to a range of 3.7 - 11.3 GPa. The modulus decreased slightly with the film thickness varying from 80 nm to 1.5 microns for films prepared under the same deposition conditions. The hardness of films (0.7 - 2.1 GPa) was proportional to the Young's modulus with a relatively high ratio of 0.185 associated with a higher mean compressive elastic strain with respect to other groups of plasma polymers (0.059 - 0.115). Thin films exhibited an abrupt increase in hardness at the film surface relat ed to post-deposition oxidation. (en)
  • Vybrané mechanické vlastnosti (modul pružnosti, tvrdost) pp-VTES vrstev lze řídit pomocí výkonu pulzního plazmatu. (cs)
Title
  • RF-power-controlled Young's modulus of plasma-polymerized organosilicon films
  • RF-power-controlled Young's modulus of plasma-polymerized organosilicon films (en)
  • Youngův modul pružnosti v plazmových polymerů na bázi organokřemičitanů řízený RF výkonem (cs)
skos:prefLabel
  • RF-power-controlled Young's modulus of plasma-polymerized organosilicon films
  • RF-power-controlled Young's modulus of plasma-polymerized organosilicon films (en)
  • Youngův modul pružnosti v plazmových polymerů na bázi organokřemičitanů řízený RF výkonem (cs)
skos:notation
  • RIV/00216305:26310/05:PU52892!RIV06-MSM-26310___
http://linked.open.../vavai/riv/strany
  • 5099-5102
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(1P05OC087), P(GA104/03/0236), P(OC 527.110)
http://linked.open...iv/cisloPeriodika
  • 18
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 541107
http://linked.open...ai/riv/idVysledku
  • RIV/00216305:26310/05:PU52892
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • CVD; thin film; nanoindentation; mechanical properties; organosilicon (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • CZ - Česká republika
http://linked.open...ontrolniKodProRIV
  • [AD10E0E9BD45]
http://linked.open...i/riv/nazevZdroje
  • Journal of Materials Science
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 40
http://linked.open...iv/tvurceVysledku
  • Vaněk, Jan
  • Čech, Vladimír
  • Goruppa, Alexander
  • Jones, Frank
issn
  • 0022-2461
number of pages
http://localhost/t...ganizacniJednotka
  • 26310
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