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| rdf:type
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| Description
| - We would like to demonstrate a possibility to deposit plasma polymer films of high reproducibility and controlled physico-chemical properties. Plasma polymer films were prepared by plasma-enhanced chemical vapor deposition (PE CVD) employing an RF helical coupling system [1] operated at continuous or pulsed regime. The effective power (Weff) of pulsed plasma was controlled by changing the ratio of the time when plasma is switched on (ton) to the time when plasma is switched off (toff), Weff = Wtotal x tton/(ton+ toff), where Wtotal= 50 W. Vinyltriethoxysilane (VTES) was used as the monomer. Thin films were deposited on silicon wafers or special microscope slides without flaws pretreated by Ar plasma (10 sccm, 10 Pa, 25 W) for 10 min. Employing a mechanical manipulator the pretreated substrate was placed into the plasma zone after plasma reached the steady state monitored by mass spectroscopy. The film thickness was measured by a Profiler Talystep (Taylor-Hobson) or a spectroscopic phase-modulated elli
- We would like to demonstrate a possibility to deposit plasma polymer films of high reproducibility and controlled physico-chemical properties. Plasma polymer films were prepared by plasma-enhanced chemical vapor deposition (PE CVD) employing an RF helical coupling system [1] operated at continuous or pulsed regime. The effective power (Weff) of pulsed plasma was controlled by changing the ratio of the time when plasma is switched on (ton) to the time when plasma is switched off (toff), Weff = Wtotal x tton/(ton+ toff), where Wtotal= 50 W. Vinyltriethoxysilane (VTES) was used as the monomer. Thin films were deposited on silicon wafers or special microscope slides without flaws pretreated by Ar plasma (10 sccm, 10 Pa, 25 W) for 10 min. Employing a mechanical manipulator the pretreated substrate was placed into the plasma zone after plasma reached the steady state monitored by mass spectroscopy. The film thickness was measured by a Profiler Talystep (Taylor-Hobson) or a spectroscopic phase-modulated elli (en)
- Rádi bychom ukázali možnosti depozice plazmového polymeru - vysokou reprodukovatelnost a říditelnost fyzikálně chemických vlastností. Plazmové polymery byly připravovány PE CVD metodou s využitím RF výboje pracujícího v pulzním režimu. Efektivní výkon (Weff) pulsního výboje byl řízen změnou poměru dob, kdy plazma je zapnuto (ton) k době, kdy je plazma vypnuto (toff), Weff = Wtotal x ton/(ton+ toff), kde Wtotal= 50 W. Vinyltrietoxysilan (VTES) byl použit jako monomer. Tenké vrstvy byly deponovány na SSi-wafery nebo speciální mikroskopické sklo, jež bylo předčištěno argonovým plazmatem (10 sccm, 10 Pa, 25 W) po dobu 10 min. Pomocí manipulátoru byly vrstvy zasunuty do reaktoru až po ustálení podmínek v něm. Tloušťka vrstev byla měřena Profilometrem Talystep (Taylor-Hobson) nebo fázově modulovaným elipsometrem UVISEL (Jobin Yvon). (cs)
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| Title
| - Plasma polymer films prepared in RF inductive coupling system
- Plasma polymer films prepared in RF inductive coupling system (en)
- Plazmové polymery připravené v indukčně vázaném RF výboji (cs)
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| skos:prefLabel
| - Plasma polymer films prepared in RF inductive coupling system
- Plasma polymer films prepared in RF inductive coupling system (en)
- Plazmové polymery připravené v indukčně vázaném RF výboji (cs)
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| skos:notation
| - RIV/00216305:26310/05:PU52373!RIV06-MSM-26310___
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| http://linked.open.../vavai/riv/strany
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| http://linked.open...avai/riv/aktivita
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| http://linked.open...avai/riv/aktivity
| - P(1P05OC087), P(OC 527.110)
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| http://linked.open...iv/cisloPeriodika
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| http://linked.open...vai/riv/dodaniDat
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| http://linked.open...aciTvurceVysledku
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| http://linked.open.../riv/druhVysledku
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| http://linked.open...iv/duvernostUdaju
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| http://linked.open...titaPredkladatele
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| http://linked.open...dnocenehoVysledku
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| http://linked.open...ai/riv/idVysledku
| - RIV/00216305:26310/05:PU52373
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| http://linked.open...riv/jazykVysledku
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| http://linked.open.../riv/klicovaSlova
| - plasma, polymer, film, modulus (en)
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| http://linked.open.../riv/klicoveSlovo
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| http://linked.open...odStatuVydavatele
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| http://linked.open...ontrolniKodProRIV
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| http://linked.open...i/riv/nazevZdroje
| - Chemické listy (IF = 0.348)
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| http://linked.open...in/vavai/riv/obor
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| http://linked.open...ichTvurcuVysledku
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| http://linked.open...cetTvurcuVysledku
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| http://linked.open...vavai/riv/projekt
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| http://linked.open...UplatneniVysledku
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| http://linked.open...v/svazekPeriodika
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| http://linked.open...iv/tvurceVysledku
| - Přikryl, Radek
- Studýnka, Jan
- Vaněk, Jan
- Čech, Vladimír
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| issn
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| number of pages
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| http://localhost/t...ganizacniJednotka
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| is http://linked.open...avai/riv/vysledek
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