About: Plasma Diagnostic During Deposition Processes of Silane Based Thin Films     Goto   Sponge   NotDistinct   Permalink

An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

AttributesValues
rdf:type
Description
  • Our work deals with the identification of the intensive spectral lines and bands measured during the plasma deposition using the hexamethyldisiloxane (HMDSO) and the tetravinylsilane (TVS) as monomer. The deposition processes were carried out in a continual regime as well as in a pulsed regime with the varied relative pulse duration. At first, the pure monomers were used. Furthermore, tetravinylsilane was mixed in various ratios with oxygen, the CH4 + H2 gas mixture was added to hexamethyldisiloxane. WWe observed a lot of changes in intensity and character of spectra with increasing pulse duration, with increasing oxygen flow rate. Oxygen has an important role for the creation of various fragments and cyclic oligomers. In the next part of experiment,exhaust gas was investigated by gas-chromatography and mass spectrometry (GC-MS). Oligomers with complex structure were identified.
  • Our work deals with the identification of the intensive spectral lines and bands measured during the plasma deposition using the hexamethyldisiloxane (HMDSO) and the tetravinylsilane (TVS) as monomer. The deposition processes were carried out in a continual regime as well as in a pulsed regime with the varied relative pulse duration. At first, the pure monomers were used. Furthermore, tetravinylsilane was mixed in various ratios with oxygen, the CH4 + H2 gas mixture was added to hexamethyldisiloxane. WWe observed a lot of changes in intensity and character of spectra with increasing pulse duration, with increasing oxygen flow rate. Oxygen has an important role for the creation of various fragments and cyclic oligomers. In the next part of experiment,exhaust gas was investigated by gas-chromatography and mass spectrometry (GC-MS). Oligomers with complex structure were identified. (en)
  • Práce podává přehled o spektrálních atomárních čarách a molekulových pásech identifikovaných v emisních spektrech během depozice vrstev založených na silanech. Jako monomery byly použity hexamethyldisiloxane (HMDSO) a tetravinylsilane (TVS). Depozice probíhala v kontinuálním i pulsním režimu s proměnlivou délkou pulsu. Kromě čistých monomerů byly použity k depozici i jejich směsi s kyslíkem a směs CH4 + H2. Byly pozorovány výrazné změny ve spektrech jak vlivem složení reakční směsi, tak i dalších depozzičních podmínek. Kyslík hraje významnou roli při vzniku různých fragmentů a cyklických oligomerů. Poslední experimenty byly zaměřeny na studium složení plazmatu pomocí GC-MS. (cs)
Title
  • Diagnostika plazmatu během depozice tenkých vrstev založených na silanu (cs)
  • Plasma Diagnostic During Deposition Processes of Silane Based Thin Films
  • Plasma Diagnostic During Deposition Processes of Silane Based Thin Films (en)
skos:prefLabel
  • Diagnostika plazmatu během depozice tenkých vrstev založených na silanu (cs)
  • Plasma Diagnostic During Deposition Processes of Silane Based Thin Films
  • Plasma Diagnostic During Deposition Processes of Silane Based Thin Films (en)
skos:notation
  • RIV/00216305:26310/04:PU46602!RIV/2005/GA0/263105/N
http://linked.open.../vavai/riv/strany
  • 1036-1041
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(GD202/03/H162)
http://linked.open...iv/cisloPeriodika
  • C
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 579675
http://linked.open...ai/riv/idVysledku
  • RIV/00216305:26310/04:PU46602
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • optical spectrum, tetravinylsilane, effective power (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • CZ - Česká republika
http://linked.open...ontrolniKodProRIV
  • [E21B01A29B94]
http://linked.open...i/riv/nazevZdroje
  • Czechoslovak Journal of Physics
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 54
http://linked.open...iv/tvurceVysledku
  • Krčma, František
  • Vaněk, Jan
  • Rašková, Zuzana
  • Brandejs, Kamil
issn
  • 0011-4626
number of pages
http://localhost/t...ganizacniJednotka
  • 26310
Faceted Search & Find service v1.16.118 as of Jun 21 2024


Alternative Linked Data Documents: ODE     Content Formats:   [cxml] [csv]     RDF   [text] [turtle] [ld+json] [rdf+json] [rdf+xml]     ODATA   [atom+xml] [odata+json]     Microdata   [microdata+json] [html]    About   
This material is Open Knowledge   W3C Semantic Web Technology [RDF Data] Valid XHTML + RDFa
OpenLink Virtuoso version 07.20.3240 as of Jun 21 2024, on Linux (x86_64-pc-linux-gnu), Single-Server Edition (126 GB total memory, 58 GB memory in use)
Data on this page belongs to its respective rights holders.
Virtuoso Faceted Browser Copyright © 2009-2024 OpenLink Software