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  • This study describes morphology and structure of SiC thin films which are grown up by sublimation epitaxy in vacuum on the 6H-SiC substrates with thickness from tens of nanometers up to units of micrometers. Fashioned films are quite uniform in surface and volume. The crystal properties of the wafers and epitaxial layers are studied by electron diffraction investigation, X-ray techniques, and scanning probe microscopy. X-ray rocking curves show that structural perfection of SiC films is comparable with the structural perfection of monocrystalline 6H-SiC substrates. Calculated lattice parameters of epilayer by X-ray diffractometry also match with known values for 6H-SiC. Electron-diffraction measurement gives the confirmation of the crystallinity of the obtained layers and it is also proved by scanning probe microscopy. This technology allows making of defect treatment of the wafer in dependence on epitaxial conditions. Fundamental analysis in this field allows optimize conditions of thin films formati
  • This study describes morphology and structure of SiC thin films which are grown up by sublimation epitaxy in vacuum on the 6H-SiC substrates with thickness from tens of nanometers up to units of micrometers. Fashioned films are quite uniform in surface and volume. The crystal properties of the wafers and epitaxial layers are studied by electron diffraction investigation, X-ray techniques, and scanning probe microscopy. X-ray rocking curves show that structural perfection of SiC films is comparable with the structural perfection of monocrystalline 6H-SiC substrates. Calculated lattice parameters of epilayer by X-ray diffractometry also match with known values for 6H-SiC. Electron-diffraction measurement gives the confirmation of the crystallinity of the obtained layers and it is also proved by scanning probe microscopy. This technology allows making of defect treatment of the wafer in dependence on epitaxial conditions. Fundamental analysis in this field allows optimize conditions of thin films formati (en)
Title
  • Theoretical and Experimental Investigation of SiC Thin Films Surface
  • Theoretical and Experimental Investigation of SiC Thin Films Surface (en)
skos:prefLabel
  • Theoretical and Experimental Investigation of SiC Thin Films Surface
  • Theoretical and Experimental Investigation of SiC Thin Films Surface (en)
skos:notation
  • RIV/00216305:26220/12:PU100610!RIV13-GA0-26220___
http://linked.open...avai/predkladatel
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(ED2.1.00/03.0072), P(GAP102/10/2013), P(LH11060)
http://linked.open...iv/cisloPeriodika
  • 5
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
  • Dallaeva, Dinara
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 174185
http://linked.open...ai/riv/idVysledku
  • RIV/00216305:26220/12:PU100610
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • silicon carbide, sublimation, atomic force microscopy (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • CZ - Česká republika
http://linked.open...ontrolniKodProRIV
  • [929B86B55CB1]
http://linked.open...i/riv/nazevZdroje
  • ElectroScope - http://www.electroscope.zcu.cz
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 2012
http://linked.open...iv/tvurceVysledku
  • Tománek, Pavel
  • Bilalov, Bilal
  • Dallaeva, Dinara
issn
  • 1802-4564
number of pages
http://localhost/t...ganizacniJednotka
  • 26220
is http://linked.open...avai/riv/vysledek of
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