About: Scanning electron microscopy of the thin layers of silicon carbide-aluminum nitride solid solution formatted by sublimation epitaxy

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About: Scanning electron microscopy of the thin layers of silicon carbide-aluminum nitride solid solution formatted by sublimation epitaxy Goto Sponge NotDistinct Permalink

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	The purpose of the study is formation and investigation of SiC/(SiC)1-x(AlN)x structure by scanning electron microscopy and atomic force microscopy. Sublimation epitaxy of the policrystalline sourse of (SiC)1-x(AlN)x was used. The optimal conditions of sublimation process are defined. These structures could be used as substrate for desing of semiconductor devices on the basis of nitrides, including gallium nitride, aluminum nitride and their alloys, it also can be uses for production of transistors with high mobility of electrons and also for creation of blue and ultraviolet lith emmiters, in light-emmited diodes and laser diodes. The purpose of the study is formation and investigation of SiC/(SiC)1-x(AlN)x structure by scanning electron microscopy and atomic force microscopy. Sublimation epitaxy of the policrystalline sourse of (SiC)1-x(AlN)x was used. The optimal conditions of sublimation process are defined. These structures could be used as substrate for desing of semiconductor devices on the basis of nitrides, including gallium nitride, aluminum nitride and their alloys, it also can be uses for production of transistors with high mobility of electrons and also for creation of blue and ultraviolet lith emmiters, in light-emmited diodes and laser diodes. (en)
Title	Scanning electron microscopy of the thin layers of silicon carbide-aluminum nitride solid solution formatted by sublimation epitaxy Scanning electron microscopy of the thin layers of silicon carbide-aluminum nitride solid solution formatted by sublimation epitaxy (en)
skos:prefLabel	Scanning electron microscopy of the thin layers of silicon carbide-aluminum nitride solid solution formatted by sublimation epitaxy Scanning electron microscopy of the thin layers of silicon carbide-aluminum nitride solid solution formatted by sublimation epitaxy (en)
skos:notation	RIV/00216305:26220/12:PU100264!RIV14-MSM-26220___
http://linked.open...avai/predkladatel	Fakulta elektrotechniky a komunikačních technologií
http://linked.open...avai/riv/aktivita	P S
http://linked.open...avai/riv/aktivity	P(ED2.1.00/03.0072), P(GAP102/11/0995), P(LH11060), S
http://linked.open...vai/riv/dodaniDat	2014
http://linked.open...aciTvurceVysledku	Tománek, Pavel Dallaeva, Dinara
http://linked.open.../riv/druhVysledku	D - Článek ve sborníku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Vysoké učení technické v Brně / Fakulta elektrotechniky a komunikačních technologií
http://linked.open...dnocenehoVysledku	166798
http://linked.open...ai/riv/idVysledku	RIV/00216305:26220/12:PU100264
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	compostion, morphology, temperature, sublimation (en)
http://linked.open.../riv/klicoveSlovo	temperature morphology sublimation compostion
http://linked.open...ontrolniKodProRIV	[0CCA700C5B9E]
http://linked.open...v/mistoKonaniAkce	Liberec
http://linked.open...i/riv/mistoVydani	Prague 8
http://linked.open...i/riv/nazevZdroje	Optics and Measurement 2012
http://linked.open...in/vavai/riv/obor	JA
http://linked.open...ichTvurcuVysledku	2 (xsd:int)
http://linked.open...cetTvurcuVysledku	3 (xsd:int)
http://linked.open...vavai/riv/projekt	Study of local electronic and optical characteristics of solar cells Centre of sensor, information and communication systems Electron transport, Noise and Diagnostic of Shottky and Autoemission Cathodes
http://linked.open...UplatneniVysledku	2012
http://linked.open...iv/tvurceVysledku	Tománek, Pavel Bilalov, Bilal Dallaeva, Dinara
http://linked.open...vavai/riv/typAkce	EUR - Evropská
http://linked.open.../riv/zahajeniAkce	2012-10-16 (xsd:date)
number of pages	4 (xsd:int)
http://purl.org/ne...btex#hasPublisher	Institute of Plasma Physics AS CR, v.v.i. - TOPTEC
https://schema.org/isbn	978-80-87026-02-1
http://localhost/t...ganizacniJednotka	26220

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