| Attributes | Values |
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| rdf:type
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| Description
| - Non-linearity measurements are widely used for quality and reliability testing of passive components. The main non-linearity sources in the ruthenium based thick film resistors are the transitions between conducting grains in the resistive paste volume,and the defects and cracks in the resistive layer and resistor/contact interface. The third harmonic voltage measurements are offered to investigate the effect of the degradation mechanism in thick film resistors after high current pulses. We applied to the resistors three short current pulses (t = 5 ms) with current density Jmax reaching 100times value of nominal current density JNom. This is sufficient to screen unstable devices. Third harmonic voltage (THV) and resistance were measured before and after the pulse stressing. We have found good correlation between relative change of THV and relative change of resistance, however THV measurements are about 5 times more sensitive. THV change after pulse stressing is proportional to the number of pulses
- Non-linearity measurements are widely used for quality and reliability testing of passive components. The main non-linearity sources in the ruthenium based thick film resistors are the transitions between conducting grains in the resistive paste volume,and the defects and cracks in the resistive layer and resistor/contact interface. The third harmonic voltage measurements are offered to investigate the effect of the degradation mechanism in thick film resistors after high current pulses. We applied to the resistors three short current pulses (t = 5 ms) with current density Jmax reaching 100times value of nominal current density JNom. This is sufficient to screen unstable devices. Third harmonic voltage (THV) and resistance were measured before and after the pulse stressing. We have found good correlation between relative change of THV and relative change of resistance, however THV measurements are about 5 times more sensitive. THV change after pulse stressing is proportional to the number of pulses (en)
- Non-linearity measurements are widely used for quality and reliability testing of passive components. The main non-linearity sources in the ruthenium based thick film resistors are the transitions between conducting grains in the resistive paste volume,and the defects and cracks in the resistive layer and resistor/contact interface. The third harmonic voltage measurements are offered to investigate the effect of the degradation mechanism in thick film resistors after high current pulses. We applied to the resistors three short current pulses (t = 5 ms) with current density Jmax reaching 100times value of nominal current density JNom. This is sufficient to screen unstable devices. Third harmonic voltage (THV) and resistance were measured before and after the pulse stressing. We have found good correlation between relative change of THV and relative change of resistance, however THV measurements are about 5 times more sensitive. THV change after pulse stressing is proportional to the number of pulses, (cs)
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| Title
| - Změna nelinearity způsobená proudovým namáháním v tlustovrstvových odporech (cs)
- Non-lineartiy changes induced by current stress in thick film resistors
- Non-lineartiy changes induced by current stress in thick film resistors (en)
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| skos:prefLabel
| - Změna nelinearity způsobená proudovým namáháním v tlustovrstvových odporech (cs)
- Non-lineartiy changes induced by current stress in thick film resistors
- Non-lineartiy changes induced by current stress in thick film resistors (en)
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| skos:notation
| - RIV/00216305:26220/04:PU45416!RIV/2005/MSM/262205/N
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| http://linked.open.../vavai/riv/strany
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| http://linked.open...avai/riv/aktivita
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| http://linked.open...avai/riv/aktivity
| - P(ME 605), Z(MSM 262200022)
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| http://linked.open...iv/cisloPeriodika
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| http://linked.open...vai/riv/dodaniDat
| |
| http://linked.open...aciTvurceVysledku
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| http://linked.open.../riv/druhVysledku
| |
| http://linked.open...iv/duvernostUdaju
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| http://linked.open...titaPredkladatele
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| http://linked.open...dnocenehoVysledku
| |
| http://linked.open...ai/riv/idVysledku
| - RIV/00216305:26220/04:PU45416
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| http://linked.open...riv/jazykVysledku
| |
| http://linked.open.../riv/klicovaSlova
| - Thick film resistors, Non-linearity, Voltage pulse stressing (en)
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| http://linked.open.../riv/klicoveSlovo
| |
| http://linked.open...odStatuVydavatele
| - US - Spojené státy americké
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| http://linked.open...ontrolniKodProRIV
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| http://linked.open...i/riv/nazevZdroje
| - Capacitor and Resistor Technology
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| http://linked.open...in/vavai/riv/obor
| |
| http://linked.open...ichTvurcuVysledku
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| http://linked.open...cetTvurcuVysledku
| |
| http://linked.open...vavai/riv/projekt
| |
| http://linked.open...UplatneniVysledku
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| http://linked.open...v/svazekPeriodika
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| http://linked.open...iv/tvurceVysledku
| - Sedláková, Vlasta
- Tacano, Munecazu
- Šikula, Josef
- Dobis, Pavel
- Melkes, František
- Hashiguchi, Sumihisa
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| http://linked.open...n/vavai/riv/zamer
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| issn
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| number of pages
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| http://localhost/t...ganizacniJednotka
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