About: Sub-micrometer soft lithography of a bulk chalcogenide glass     Goto   Sponge   NotDistinct   Permalink

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  • We demonstrate, for the first time, time-and cost-effective replication of sub-micrometer features from a soft PDMS mold onto a bulk chalcogenide glass over a large surface area. A periodic array of submicrometer lines (diffraction grating) with period 625 nm, amplitude 45 nm and surface roughness 3 nm was imprinted onto the surface of the chalcogenide AsSe2 bulk glass at temperature 225 degrees C, i.e. 5 degrees C below the softening point of the glass. Sub-micrometer soft lithography into chalcogenide bulk glasses shows good reliability, reproducibility and promise for feasible fabrication of various dispersive optical elements, antireflection surfaces, 2D photonic structures and nano-structured surfaces for enhanced photonic properties and chemical sensing. (C) 2013 Optical Society of America
  • We demonstrate, for the first time, time-and cost-effective replication of sub-micrometer features from a soft PDMS mold onto a bulk chalcogenide glass over a large surface area. A periodic array of submicrometer lines (diffraction grating) with period 625 nm, amplitude 45 nm and surface roughness 3 nm was imprinted onto the surface of the chalcogenide AsSe2 bulk glass at temperature 225 degrees C, i.e. 5 degrees C below the softening point of the glass. Sub-micrometer soft lithography into chalcogenide bulk glasses shows good reliability, reproducibility and promise for feasible fabrication of various dispersive optical elements, antireflection surfaces, 2D photonic structures and nano-structured surfaces for enhanced photonic properties and chemical sensing. (C) 2013 Optical Society of America (en)
Title
  • Sub-micrometer soft lithography of a bulk chalcogenide glass
  • Sub-micrometer soft lithography of a bulk chalcogenide glass (en)
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  • Sub-micrometer soft lithography of a bulk chalcogenide glass
  • Sub-micrometer soft lithography of a bulk chalcogenide glass (en)
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  • RIV/00216275:25310/13:39896426!RIV14-MSM-25310___
http://linked.open...avai/predkladatel
http://linked.open...avai/riv/aktivita
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  • P(EE2.3.20.0254)
http://linked.open...iv/cisloPeriodika
  • 8
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  • 108879
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  • RIV/00216275:25310/13:39896426
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  • micro; fabrication; nanostructures; fibers; wave-guides; imprint lithography; nanoimprint lithography (en)
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  • US - Spojené státy americké
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  • [9BBBA6CF4567]
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  • Optics Express
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  • 21
http://linked.open...iv/tvurceVysledku
  • Kohoutek, Tomáš
  • Orava, Jiří
  • Fudouzi, Hiroshi
  • Greer, A. Lindsay
http://linked.open...ain/vavai/riv/wos
  • 000318151600040
issn
  • 1094-4087
number of pages
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  • 10.1364/OE.21.009584
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  • 25310
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