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Description
  • Pulzní laserovou depozicí (KrF excimer laser) byly připraveny amorfní chalkogenidové filmy ze skelných materiálů As2Se3, As3Se2 a InSe. Tloušťkové profily byly určeny pomocí VASE. Byl určen vliv skenovací techniky laserového paprsku během depozice na tvar distribuce tloušťky připravených filmů a byl popsán příslušnými rovnicemi. Výsledky byly porovnány s experimentálními daty. (cs)
  • Amorphous chalcogenide thin films were prepared from As2Se3, As3Se2 and InSe bulk glasses by pulsed laser deposition using a KrF excimer laser. Thickness profiles of the films were determined using variable angle spectroscopic ellipsometry. The influence of the laser beam scanning process during the deposition on the thickness distribution of the prepared thin films was evaluated and the corresponding equations suggested. The results were compared with experimental data.
  • Amorphous chalcogenide thin films were prepared from As2Se3, As3Se2 and InSe bulk glasses by pulsed laser deposition using a KrF excimer laser. Thickness profiles of the films were determined using variable angle spectroscopic ellipsometry. The influence of the laser beam scanning process during the deposition on the thickness distribution of the prepared thin films was evaluated and the corresponding equations suggested. The results were compared with experimental data. (en)
Title
  • Thickness Distribution of Amorphous Chalcogenide Films Prepared by Pulsed Laser Deposition.
  • Tloušťkové rozložení amorfních chalkogenidových filmů připravených pulzní laserovou depozicí (cs)
  • Thickness Distribution of Amorphous Chalcogenide Films Prepared by Pulsed Laser Deposition. (en)
skos:prefLabel
  • Thickness Distribution of Amorphous Chalcogenide Films Prepared by Pulsed Laser Deposition.
  • Tloušťkové rozložení amorfních chalkogenidových filmů připravených pulzní laserovou depozicí (cs)
  • Thickness Distribution of Amorphous Chalcogenide Films Prepared by Pulsed Laser Deposition. (en)
skos:notation
  • RIV/00216275:25310/08:00007556!RIV09-GA0-25310___
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(GA104/08/0229), P(LC523), Z(MSM0021627501)
http://linked.open...iv/cisloPeriodika
  • 3
http://linked.open...vai/riv/dodaniDat
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  • 399962
http://linked.open...ai/riv/idVysledku
  • RIV/00216275:25310/08:00007556
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  • Chalcogenide-film; Thickness distribution; Thin-films; PLD (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • US - Spojené státy americké
http://linked.open...ontrolniKodProRIV
  • [D70332BF070D]
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  • Applied Physics A-Materials Science & Procesing
http://linked.open...in/vavai/riv/obor
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http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 93
http://linked.open...iv/tvurceVysledku
  • Frumar, Miloslav
  • Němec, Petr
  • Pavlišta, Martin
  • Hrdlička, M.
  • Přikryl, J.
http://linked.open...n/vavai/riv/zamer
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  • 0947-8396
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  • 25310
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