About: Growth, Structure, and Electronic Properties of Epitaxial Bismuth Telluride Topological Insulator Films on BaF2 (111) Substrates     Goto   Sponge   NotDistinct   Permalink

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  • Epitaxial growth of topological insulator bismuth telluride by molecular beam epitaxy onto BaF2 (111) substrates is studied using Bi2Te3 and Te as source materials. By changing the beam flux composition, different stoichiometric phases are obtained, resulting in high quality Bi2Te3 and Bi1Te1 epilayers as shown by Raman spectroscopy and high-resolution X-ray diffraction. From X-ray reciprocal space mapping, the residual strain, as well as size of coherently scattering domains are deduced. The Raman modes for the two different phases are identified and the dielectric functions derived from spectroscopic ellipsometry investigations. Angular resolved photoemission reveals topologically protected surface states of the Bi2Te3 epilayers. Thus, BaF2 is a perfectly suited substrate material for the bismuth telluride compounds.
  • Epitaxial growth of topological insulator bismuth telluride by molecular beam epitaxy onto BaF2 (111) substrates is studied using Bi2Te3 and Te as source materials. By changing the beam flux composition, different stoichiometric phases are obtained, resulting in high quality Bi2Te3 and Bi1Te1 epilayers as shown by Raman spectroscopy and high-resolution X-ray diffraction. From X-ray reciprocal space mapping, the residual strain, as well as size of coherently scattering domains are deduced. The Raman modes for the two different phases are identified and the dielectric functions derived from spectroscopic ellipsometry investigations. Angular resolved photoemission reveals topologically protected surface states of the Bi2Te3 epilayers. Thus, BaF2 is a perfectly suited substrate material for the bismuth telluride compounds. (en)
Title
  • Growth, Structure, and Electronic Properties of Epitaxial Bismuth Telluride Topological Insulator Films on BaF2 (111) Substrates
  • Growth, Structure, and Electronic Properties of Epitaxial Bismuth Telluride Topological Insulator Films on BaF2 (111) Substrates (en)
skos:prefLabel
  • Growth, Structure, and Electronic Properties of Epitaxial Bismuth Telluride Topological Insulator Films on BaF2 (111) Substrates
  • Growth, Structure, and Electronic Properties of Epitaxial Bismuth Telluride Topological Insulator Films on BaF2 (111) Substrates (en)
skos:notation
  • RIV/00216224:14740/13:00066623!RIV14-MSM-14740___
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  • P(ED1.1.00/02.0068), P(GAP204/12/0595)
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  • 8
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  • 76945
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  • RIV/00216224:14740/13:00066623
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  • SINGLE DIRAC CONE; THIN-FILMS; SURFACE-STATES; BAND-STRUCTURE; BI2TE3 FILMS; BI2SE3; RAMAN; SELENIDE (en)
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  • US - Spojené státy americké
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  • [FEA7959F0E96]
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  • Crystal Growth & Design
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  • 13
http://linked.open...iv/tvurceVysledku
  • Caha, Ondřej
  • Holý, Václav
  • Dubroka, Adam
  • Humlíček, Josef
  • Bauer, Günther
  • Rader, Oliver
  • Sanchez-Barriga, Jaime
  • Sirenko, Andrei A.
  • Springholz, Günter
  • Stanislavchuk, T. N.
  • Steiner, Hubert
  • Ul-Hassan, M.
http://linked.open...ain/vavai/riv/wos
  • 000323020000013
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  • 1528-7483
number of pages
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  • 10.1021/cg400048g
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  • 14740
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