About: Automatic and robust deposition process control to grow hard nc-TiC/a-C:H coatings using industrial magnetron sputtering devices

Facets (new session)
Description
Metadata
Settings
- owl:sameAs
- Inference Rule:

About: Automatic and robust deposition process control to grow hard nc-TiC/a-C:H coatings using industrial magnetron sputtering devices Goto Sponge NotDistinct Permalink

An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

Attributes	Values
rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	nc-TiC/a-C:H coatings consist of TiC crystallites embedded in an amorphous hydrogenated carbon matrix. Depending mainly on the chemical composition (ratio of Ti/C), the properties of these coatings can be tailored from hard coatings to tribological coatings, with low coefficients of friction and wear. However none of the major industrial coating centers offer this coating in their portfolio, probably because of the lack of the reliable deposition technology. In our research, we employed industrial PVD device of Platit equipped with a central titanium rotating cylindrical cathode. Titanium was sputtered in a mixture of argon and acetylene. When the acetylene supply was gradually increased, deposition process characteristics such as the cathode voltage and the total pressure in the deposition chamber underwent a sudden change. At critical acetylene supply, a sudden drop in the cathode voltage was observed, while before and after the drop, the cathode voltage evolved slowly. nc-TiC/a-C:H coatings consist of TiC crystallites embedded in an amorphous hydrogenated carbon matrix. Depending mainly on the chemical composition (ratio of Ti/C), the properties of these coatings can be tailored from hard coatings to tribological coatings, with low coefficients of friction and wear. However none of the major industrial coating centers offer this coating in their portfolio, probably because of the lack of the reliable deposition technology. In our research, we employed industrial PVD device of Platit equipped with a central titanium rotating cylindrical cathode. Titanium was sputtered in a mixture of argon and acetylene. When the acetylene supply was gradually increased, deposition process characteristics such as the cathode voltage and the total pressure in the deposition chamber underwent a sudden change. At critical acetylene supply, a sudden drop in the cathode voltage was observed, while before and after the drop, the cathode voltage evolved slowly. (en)
Title	Automatic and robust deposition process control to grow hard nc-TiC/a-C:H coatings using industrial magnetron sputtering devices Automatic and robust deposition process control to grow hard nc-TiC/a-C:H coatings using industrial magnetron sputtering devices (en)
skos:prefLabel	Automatic and robust deposition process control to grow hard nc-TiC/a-C:H coatings using industrial magnetron sputtering devices Automatic and robust deposition process control to grow hard nc-TiC/a-C:H coatings using industrial magnetron sputtering devices (en)
skos:notation	RIV/00216224:14310/14:00073878!RIV15-MSM-14310___
http://linked.open...avai/riv/aktivita	P
http://linked.open...avai/riv/aktivity	P(ED2.1.00/03.0086), P(GAP205/12/0407)
http://linked.open...vai/riv/dodaniDat	2015
http://linked.open...aciTvurceVysledku	Žemlička, Radek Souček, Pavel Vašina, Petr Buršíková, Vilma
http://linked.open.../riv/druhVysledku	O - Ostatní výsledky nezařaditelné do žádného z výše uvedených druhů výsledku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Masarykova univerzita / Přírodovědecká fakulta
http://linked.open...dnocenehoVysledku	4573
http://linked.open...ai/riv/idVysledku	RIV/00216224:14310/14:00073878
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	magnetron sputtering; TiC (en)
http://linked.open.../riv/klicoveSlovo	magnetron sputtering TiC
http://linked.open...ontrolniKodProRIV	[528F43AE003E]
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	4 (xsd:int)
http://linked.open...cetTvurcuVysledku	6 (xsd:int)
http://linked.open...vavai/riv/projekt	Regional R&D center for low-cost plasma and nanotechnology surface modifications Understanding of Hybrid PVD-PECVD Process with Aim to Control Grow of Nanostructured Composite Coatings
http://linked.open...UplatneniVysledku	2014
http://linked.open...iv/tvurceVysledku	Buršíková, Vilma Vašina, Petr Žemlička, Radek Jílek, Mojmír Souček, Pavel Vogl, Petr
http://localhost/t...ganizacniJednotka	14310

Faceted Search & Find service v1.16.118 as of Jun 21 2024

Alternative Linked Data Documents: ODE Content Formats:

RDF

ODATA

Microdata

About

OpenLink Virtuoso version 07.20.3240 as of Jun 21 2024, on Linux (x86_64-pc-linux-gnu), Single-Server Edition (126 GB total memory, 58 GB memory in use)
Data on this page belongs to its respective rights holders.
Virtuoso Faceted Browser Copyright © 2009-2024 OpenLink Software