About: Preparation of hard and moderately ductile Mo2BC coatings by pulsed DC magnetron sputtering

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About: Preparation of hard and moderately ductile Mo2BC coatings by pulsed DC magnetron sputtering Goto Sponge NotDistinct Permalink

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Standard ceramic materials nowadays used as protective coatings such as TiN, TiAlN, c-BN, etc., exhibit high hardness and high stiffness. However these are often connected to brittle behaviour of the coating thus limiting the lifetime of the coating and of the coated tool as well. To overcome these limitations, a new generation of materials with high hardness and moderate ductility is sought for. Recently, nanolaminate Mo2BC coatings were predicted to have these advantageousproperties. However deposition conditions so far necessary to deposit Mo2BC coatings are a limiting factor. First, deposition process utilizing combinatorial DC magnetron sputtering required substrate temperature of 900°C. Secondly, a low temperature synthesis method reducing the substrate temperature to 380°C required using HiPIMS with compound Mo2BC target [2]. Both of these methods pose significant problems with industrial scale production. Standard ceramic materials nowadays used as protective coatings such as TiN, TiAlN, c-BN, etc., exhibit high hardness and high stiffness. However these are often connected to brittle behaviour of the coating thus limiting the lifetime of the coating and of the coated tool as well. To overcome these limitations, a new generation of materials with high hardness and moderate ductility is sought for. Recently, nanolaminate Mo2BC coatings were predicted to have these advantageousproperties. However deposition conditions so far necessary to deposit Mo2BC coatings are a limiting factor. First, deposition process utilizing combinatorial DC magnetron sputtering required substrate temperature of 900°C. Secondly, a low temperature synthesis method reducing the substrate temperature to 380°C required using HiPIMS with compound Mo2BC target [2]. Both of these methods pose significant problems with industrial scale production. (en)
Title	Preparation of hard and moderately ductile Mo2BC coatings by pulsed DC magnetron sputtering Preparation of hard and moderately ductile Mo2BC coatings by pulsed DC magnetron sputtering (en)
skos:prefLabel	Preparation of hard and moderately ductile Mo2BC coatings by pulsed DC magnetron sputtering Preparation of hard and moderately ductile Mo2BC coatings by pulsed DC magnetron sputtering (en)
skos:notation	RIV/00216224:14310/14:00073875!RIV15-MSM-14310___
http://linked.open...avai/riv/aktivita	P
http://linked.open...avai/riv/aktivity	P(ED2.1.00/03.0086), P(GAP205/12/0407)
http://linked.open...vai/riv/dodaniDat	2015
http://linked.open...aciTvurceVysledku	Stupavská, Monika Souček, Pavel Zábranský, Lukáš Vašina, Petr Buršíková, Vilma
http://linked.open.../riv/druhVysledku	O - Ostatní výsledky nezařaditelné do žádného z výše uvedených druhů výsledku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Masarykova univerzita / Přírodovědecká fakulta
http://linked.open...dnocenehoVysledku	39030
http://linked.open...ai/riv/idVysledku	RIV/00216224:14310/14:00073875
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	magnetron sputtering; Mo2BC (en)
http://linked.open.../riv/klicoveSlovo	magnetron sputtering Mo2BC
http://linked.open...ontrolniKodProRIV	[461B69EDFAA5]
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	5 (xsd:int)
http://linked.open...cetTvurcuVysledku	5 (xsd:int)
http://linked.open...vavai/riv/projekt	Regional R&D center for low-cost plasma and nanotechnology surface modifications Understanding of Hybrid PVD-PECVD Process with Aim to Control Grow of Nanostructured Composite Coatings
http://linked.open...UplatneniVysledku	2014
http://linked.open...iv/tvurceVysledku	Buršíková, Vilma Vašina, Petr Souček, Pavel Zábranský, Lukáš Stupavská, Monika
http://localhost/t...ganizacniJednotka	14310

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