About: Comparison of nc-TiC/a-C:H Films Prepared by PVD-PECVD Process at Low and High Ion Bombardment

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About: Comparison of nc-TiC/a-C:H Films Prepared by PVD-PECVD Process at Low and High Ion Bombardment Goto Sponge NotDistinct Permalink

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Two series of nc-TiC/a-C:H coatings with varying chemical composition were prepared using a deposition process consisting of titanium target sputtering in argon/acetylene atmosphere combined into a hybrid PVD-PECVD. The range of chemical compositions was chosen in order to achieve optimal hardness of the coatings – from 30 at.% to 70 at.% Ti. The films were ~ 5 microns thick with 700 nm titanium interlayer to promote the adhesion of the coatings to industrially important substrates like cemented tungsten carbide and high speed steel. The different levels of ion bombardment were achieved by different magnetic fields on the cathode. A well-balanced magnetic field was used for low ion bombardment of the growing film and a strongly unbalanced magnetic field was used for high bombardment. We kept all other deposition parameters such as pressure and substrate temperature constant for both magnetic field configurations as to single out the effect of the ion bombardment on the properties of the film. Two series of nc-TiC/a-C:H coatings with varying chemical composition were prepared using a deposition process consisting of titanium target sputtering in argon/acetylene atmosphere combined into a hybrid PVD-PECVD. The range of chemical compositions was chosen in order to achieve optimal hardness of the coatings – from 30 at.% to 70 at.% Ti. The films were ~ 5 microns thick with 700 nm titanium interlayer to promote the adhesion of the coatings to industrially important substrates like cemented tungsten carbide and high speed steel. The different levels of ion bombardment were achieved by different magnetic fields on the cathode. A well-balanced magnetic field was used for low ion bombardment of the growing film and a strongly unbalanced magnetic field was used for high bombardment. We kept all other deposition parameters such as pressure and substrate temperature constant for both magnetic field configurations as to single out the effect of the ion bombardment on the properties of the film. (en)
Title	Comparison of nc-TiC/a-C:H Films Prepared by PVD-PECVD Process at Low and High Ion Bombardment Comparison of nc-TiC/a-C:H Films Prepared by PVD-PECVD Process at Low and High Ion Bombardment (en)
skos:prefLabel	Comparison of nc-TiC/a-C:H Films Prepared by PVD-PECVD Process at Low and High Ion Bombardment Comparison of nc-TiC/a-C:H Films Prepared by PVD-PECVD Process at Low and High Ion Bombardment (en)
skos:notation	RIV/00216224:14310/12:00057711!RIV13-GA0-14310___
http://linked.open...avai/predkladatel	Přírodovědecká fakulta
http://linked.open...avai/riv/aktivita	P
http://linked.open...avai/riv/aktivity	P(ED2.1.00/03.0086), P(GAP205/12/0407), P(GD104/09/H080)
http://linked.open...vai/riv/dodaniDat	2013
http://linked.open...aciTvurceVysledku	Souček, Pavel Schmidtová, Tereza Zábranský, Lukáš Vašina, Petr Buršíková, Vilma
http://linked.open.../riv/druhVysledku	O - Ostatní výsledky nezařaditelné do žádného z výše uvedených druhů výsledku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Masarykova univerzita / Přírodovědecká fakulta
http://linked.open...dnocenehoVysledku	127979
http://linked.open...ai/riv/idVysledku	RIV/00216224:14310/12:00057711
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	magnetron sputtering; titanium carbide; nanocomposite (en)
http://linked.open.../riv/klicoveSlovo	magnetron sputtering nanocomposite titanium carbide
http://linked.open...ontrolniKodProRIV	[EE60C25750C7]
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	5 (xsd:int)
http://linked.open...cetTvurcuVysledku	5 (xsd:int)
http://linked.open...vavai/riv/projekt	Plasmachemical processes and their technological applications Regional R&D center for low-cost plasma and nanotechnology surface modifications Understanding of Hybrid PVD-PECVD Process with Aim to Control Grow of Nanostructured Composite Coatings
http://linked.open...UplatneniVysledku	2012
http://linked.open...iv/tvurceVysledku	Buršíková, Vilma Vašina, Petr Schmidtová, Tereza Souček, Pavel Zábranský, Lukáš
http://localhost/t...ganizacniJednotka	14310

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