About: Complex analysis of SiOxCyHz films deposited by an atmospheric pressure dielectric barrier discharge     Goto   Sponge   NotDistinct   Permalink

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  • SiOx films are deposited with an atmospheric pressure dielectric barrier discharge (apDBD) using Ar, O2 and different precursor gases (HMDSO and Silane).An experimental study on the influence of the discharge operation parameters on the chemical composition of the deposited films and the vertical structure over the film thickness is carried out by means of SEM, EDX, and ATR–FTIR.
  • SiOx films are deposited with an atmospheric pressure dielectric barrier discharge (apDBD) using Ar, O2 and different precursor gases (HMDSO and Silane).An experimental study on the influence of the discharge operation parameters on the chemical composition of the deposited films and the vertical structure over the film thickness is carried out by means of SEM, EDX, and ATR–FTIR. (en)
Title
  • Complex analysis of SiOxCyHz films deposited by an atmospheric pressure dielectric barrier discharge
  • Complex analysis of SiOxCyHz films deposited by an atmospheric pressure dielectric barrier discharge (en)
skos:prefLabel
  • Complex analysis of SiOxCyHz films deposited by an atmospheric pressure dielectric barrier discharge
  • Complex analysis of SiOxCyHz films deposited by an atmospheric pressure dielectric barrier discharge (en)
skos:notation
  • RIV/00216224:14310/11:00052854!RIV12-MSM-14310___
http://linked.open...avai/predkladatel
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • S, Z(MSM0021622411)
http://linked.open...iv/cisloPeriodika
  • 25.7.2011
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 191383
http://linked.open...ai/riv/idVysledku
  • RIV/00216224:14310/11:00052854
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • SILVER NANOPARTICLES; PLASMA; JET (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • CH - Švýcarská konfederace
http://linked.open...ontrolniKodProRIV
  • [4E92E1F636D8]
http://linked.open...i/riv/nazevZdroje
  • Surface & Coatings Technology
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
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http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 205
http://linked.open...iv/tvurceVysledku
  • Brandenburg, Ronny
  • Foest, Rüdiger
  • Horn, Stefan
  • Schäfer, Jan
  • Vašina, Petr
  • Weltmann, Klaus-Dieter
http://linked.open...ain/vavai/riv/wos
  • 000293258600071
http://linked.open...n/vavai/riv/zamer
issn
  • 0257-8972
number of pages
http://bibframe.org/vocab/doi
  • 10.1016/j.surfcoat.2011.03.124
http://localhost/t...ganizacniJednotka
  • 14310
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