About: Multilayered films based on DLC, DLC:N and SiOx grown by PECVD on stainless steel

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About: Multilayered films based on DLC, DLC:N and SiOx grown by PECVD on stainless steel Goto Sponge NotDistinct Permalink

An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Diamond-like carbon films (DLC) exhibit useful properties such as high hardness, low friction coefficient, high thermal conductivity and wide band gaps. However, due to an inherent internal stress and bad adhesion to stainless steel their use in industrial applications is limited. A better adhesion can be achieved by adding different dopants into a DLC matrix, especially for metallic substrates. Also, silicon based interlayers was used In order to promote the adhesion. Hydrogenated DLC films using different mixtures were prepared by plasma enhanced chemical vapor deposition (PECVD) using capacitively coupled rf discharge at 13.56 MHz. Optical and mechanical methods were used to to determine functional properties. The hardness and Young's modulus of multilayered films were between 14 GPa and 80 GPa, respectively. For adhesion, the critical load Lc2 ranged from 2.1 N in the case of nitrogen containing DLC, to 11.8 N for multilayered film based on SiOx. Diamond-like carbon films (DLC) exhibit useful properties such as high hardness, low friction coefficient, high thermal conductivity and wide band gaps. However, due to an inherent internal stress and bad adhesion to stainless steel their use in industrial applications is limited. A better adhesion can be achieved by adding different dopants into a DLC matrix, especially for metallic substrates. Also, silicon based interlayers was used In order to promote the adhesion. Hydrogenated DLC films using different mixtures were prepared by plasma enhanced chemical vapor deposition (PECVD) using capacitively coupled rf discharge at 13.56 MHz. Optical and mechanical methods were used to to determine functional properties. The hardness and Young's modulus of multilayered films were between 14 GPa and 80 GPa, respectively. For adhesion, the critical load Lc2 ranged from 2.1 N in the case of nitrogen containing DLC, to 11.8 N for multilayered film based on SiOx. (en)
Title	Multilayered films based on DLC, DLC:N and SiOx grown by PECVD on stainless steel Multilayered films based on DLC, DLC:N and SiOx grown by PECVD on stainless steel (en)
skos:prefLabel	Multilayered films based on DLC, DLC:N and SiOx grown by PECVD on stainless steel Multilayered films based on DLC, DLC:N and SiOx grown by PECVD on stainless steel (en)
skos:notation	RIV/00216224:14310/11:00050060!RIV12-GA0-14310___
http://linked.open...avai/predkladatel	Přírodovědecká fakulta
http://linked.open...avai/riv/aktivita	P Z
http://linked.open...avai/riv/aktivity	P(GD104/09/H080), Z(MSM0021622411)
http://linked.open...vai/riv/dodaniDat	2012
http://linked.open...aciTvurceVysledku	Peřina, Vratislav Zajíčková, Lenka Buršíková, Vilma Nečas, David Franta, Daniel Muresan, Mihai George
http://linked.open.../riv/druhVysledku	O - Ostatní výsledky nezařaditelné do žádného z výše uvedených druhů výsledku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Masarykova univerzita / Přírodovědecká fakulta
http://linked.open...dnocenehoVysledku	214255
http://linked.open...ai/riv/idVysledku	RIV/00216224:14310/11:00050060
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	Diamond-like carbon DLC; Adhesion; Silicon oxide; Nitrogen doping; Stainless steel (en)
http://linked.open.../riv/klicoveSlovo	Adhesion Diamond-like carbon DLC Nitrogen doping Silicon oxide Stainless steel
http://linked.open...ontrolniKodProRIV	[F4280A944542]
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	6 (xsd:int)
http://linked.open...cetTvurcuVysledku	6 (xsd:int)
http://linked.open...vavai/riv/projekt	Plasmachemical processes and their technological applications
http://linked.open...UplatneniVysledku	2011
http://linked.open...iv/tvurceVysledku	Buršíková, Vilma Franta, Daniel Nečas, David Zajíčková, Lenka Peřina, Vratislav Muresan, Mihai George
http://linked.open...n/vavai/riv/zamer	Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface
http://localhost/t...ganizacniJednotka	14310

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