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  • We have used two different x-ray diffraction techniques to characterize oxygen precipitates in Czochralski grown silicon. The first one is a reciprocal space mapping in the Bragg diffraction, which is used to determine the deformation field around the precipitates. The other on was simultaneous measurement of diffracted and transmitted beam in the Laue diffraction. This method gave us also concentration of oxygen precipitates.
  • We have used two different x-ray diffraction techniques to characterize oxygen precipitates in Czochralski grown silicon. The first one is a reciprocal space mapping in the Bragg diffraction, which is used to determine the deformation field around the precipitates. The other on was simultaneous measurement of diffracted and transmitted beam in the Laue diffraction. This method gave us also concentration of oxygen precipitates. (en)
Title
  • Study of oxygen precipitates in silicon using x-ray diffraction techniques
  • Study of oxygen precipitates in silicon using x-ray diffraction techniques (en)
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  • Study of oxygen precipitates in silicon using x-ray diffraction techniques
  • Study of oxygen precipitates in silicon using x-ray diffraction techniques (en)
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  • RIV/00216224:14310/08:00027768!RIV10-MSM-14310___
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  • RIV/00216224:14310/08:00027768
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  • silicon; precipitation (en)
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  • Caha, Ondřej
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  • 14310
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