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  • The paper discusses the deposition of protective coatings ranging from organosilicon plasma polymers to SiO2-like films and hard diamond-like carbon/silicon oxide (DLC : SiOx) coatings in radio frequency capacitively coupled discharges using hexamethyldisiloxane (HMDSO). As a result of the optimization of the deposition conditions it was possible to obtain high performance protective coatings. In the HMDSO/O-2 mixture, it was shown that rather than the SiO2-like film a hard cross-linked SiOx C-y H-z polymer film can be used as a protective coating for polycarbonate. The optimum conditions for the deposition of an almost stress-free film were 17% of HMDSO and dc bias voltage of -240V. The film hardness and elastic modulus were 10GPa and 75GPa, respectively. The refractive index at 600 nm was 1.5 and the extinction coefficient decreased from 0.02 at 240 nm down to zero at 600 nm.
  • The paper discusses the deposition of protective coatings ranging from organosilicon plasma polymers to SiO2-like films and hard diamond-like carbon/silicon oxide (DLC : SiOx) coatings in radio frequency capacitively coupled discharges using hexamethyldisiloxane (HMDSO). As a result of the optimization of the deposition conditions it was possible to obtain high performance protective coatings. In the HMDSO/O-2 mixture, it was shown that rather than the SiO2-like film a hard cross-linked SiOx C-y H-z polymer film can be used as a protective coating for polycarbonate. The optimum conditions for the deposition of an almost stress-free film were 17% of HMDSO and dc bias voltage of -240V. The film hardness and elastic modulus were 10GPa and 75GPa, respectively. The refractive index at 600 nm was 1.5 and the extinction coefficient decreased from 0.02 at 240 nm down to zero at 600 nm. (en)
Title
  • Deposition of protective coatings in rf organosilicon discharges
  • Deposition of protective coatings in rf organosilicon discharges (en)
skos:prefLabel
  • Deposition of protective coatings in rf organosilicon discharges
  • Deposition of protective coatings in rf organosilicon discharges (en)
skos:notation
  • RIV/00216224:14310/07:00022271!RIV11-MSM-14310___
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(1K05025), P(LC06041), Z(AV0Z10480505), Z(MSM0021622411)
http://linked.open...iv/cisloPeriodika
  • 1
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 416245
http://linked.open...ai/riv/idVysledku
  • RIV/00216224:14310/07:00022271
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • CARBON-FILMS; GLOW-DISCHARGES; PLASMA; PECVD; POLYCARBONATE; SUBSTRATE (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • GB - Spojené království Velké Británie a Severního Irska
http://linked.open...ontrolniKodProRIV
  • [068DF8216DBD]
http://linked.open...i/riv/nazevZdroje
  • Plasma Sources Science and Technology
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 16
http://linked.open...iv/tvurceVysledku
  • Buršíková, Vilma
  • Dvořák, Pavel
  • Franta, Daniel
  • Macková, Anna
  • Zajíčková, Lenka
  • Peřina, Vratislav
  • Šmíd, Radek
  • Studýnková, Zuzana
http://linked.open...ain/vavai/riv/wos
  • 000244370700016
http://linked.open...n/vavai/riv/zamer
issn
  • 0963-0252
number of pages
http://localhost/t...ganizacniJednotka
  • 14310
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