About: Comparative Study of Films Deposited from HMDSO/O2 in Continuous Wave and Pulsed rf Discharges

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	We have performed a comparative study of the properties of films deposited in the rf CCP discharges from a mixture of 5% of hexamethyldisiloxane in oxygen at two different pressures 2.5 and 40 Pa in continuous and pulsed modes. Changes in optical and especially mechanical properties of the films were observed due to differing pressure. Slight changes in the properties were also achieved by pulsing the discharge. Films deposited at 2.5 Pa exhibited very low compressive stress and hardness from 5.5 to 6.9 GPa. Soft films of 1.6 GPa maximum hardness possessing a tensile stress and containing more CH3-related groups were deposited at a pressure of 40 Pa. Hard SiO2-like films (11-13.5 GPa) were deposited from the same mixture in the ICP mode of a helicon reactor at the pressure of 0.3 Pa at which the CCP discharge could not be sustained. These films possessed relatively high compressive stress. Increasing off-time up to 15 ms caused a slight decrease in the hardness and in the case of 0. We have performed a comparative study of the properties of films deposited in the rf CCP discharges from a mixture of 5% of hexamethyldisiloxane in oxygen at two different pressures 2.5 and 40 Pa in continuous and pulsed modes. Changes in optical and especially mechanical properties of the films were observed due to differing pressure. Slight changes in the properties were also achieved by pulsing the discharge. Films deposited at 2.5 Pa exhibited very low compressive stress and hardness from 5.5 to 6.9 GPa. Soft films of 1.6 GPa maximum hardness possessing a tensile stress and containing more CH3-related groups were deposited at a pressure of 40 Pa. Hard SiO2-like films (11-13.5 GPa) were deposited from the same mixture in the ICP mode of a helicon reactor at the pressure of 0.3 Pa at which the CCP discharge could not be sustained. These films possessed relatively high compressive stress. Increasing off-time up to 15 ms caused a slight decrease in the hardness and in the case of 0. (en)
Title	Comparative Study of Films Deposited from HMDSO/O2 in Continuous Wave and Pulsed rf Discharges Comparative Study of Films Deposited from HMDSO/O2 in Continuous Wave and Pulsed rf Discharges (en)
skos:prefLabel	Comparative Study of Films Deposited from HMDSO/O2 in Continuous Wave and Pulsed rf Discharges Comparative Study of Films Deposited from HMDSO/O2 in Continuous Wave and Pulsed rf Discharges (en)
skos:notation	RIV/00216224:14310/07:00022256!RIV10-MSM-14310___
http://linked.open...avai/riv/aktivita	P Z
http://linked.open...avai/riv/aktivity	P(1K05025), Z(AV0Z20410507), Z(MSM0021622411)
http://linked.open...iv/cisloPeriodika	S1
http://linked.open...vai/riv/dodaniDat	2010
http://linked.open...aciTvurceVysledku	Zajíčková, Lenka Buršíková, Vilma Buršík, Jiří Franta, Daniel
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Masarykova univerzita / Přírodovědecká fakulta
http://linked.open...dnocenehoVysledku	414255
http://linked.open...ai/riv/idVysledku	RIV/00216224:14310/07:00022256
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	PECVD; hexamethyldisiloxane; oxygen; CCP; ICP (en)
http://linked.open.../riv/klicoveSlovo	PECVD ICP hexamethyldisiloxane CCP oxygen
http://linked.open...odStatuVydavatele	DE - Spolková republika Německo
http://linked.open...ontrolniKodProRIV	[697236911E81]
http://linked.open...i/riv/nazevZdroje	Plasma Processes and Polymers
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	4 (xsd:int)
http://linked.open...cetTvurcuVysledku	7 (xsd:int)
http://linked.open...vavai/riv/projekt	Synthesis of new Si-O(N)-C materials by plasma enhanced CVD
http://linked.open...UplatneniVysledku	2007
http://linked.open...v/svazekPeriodika	4
http://linked.open...iv/tvurceVysledku	Buršík, Jiří Buršíková, Vilma Franta, Daniel Zajíčková, Lenka Bousquet, Angelique Goullet, Antoine Granier, Agnes
http://linked.open...n/vavai/riv/zamer	Physical properties of advanced materials in relation to their microstructure and processing Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface
issn	1612-8850
number of pages	7 (xsd:int)
http://localhost/t...ganizacniJednotka	14310
is http://linked.open...avai/riv/vysledek of	Comparative Study of Films Deposited from HMDSO/O2 in Continuous Wave and Pulsed rf Discharges Comparative Study of Films Deposited from HMDSO/O2 in Continuous Wave and Pulsed rf Discharges Comparative Study of Films Deposited from HMDSO/O2 in Continuous Wave and Pulsed rf Discharges

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