About: Influence of Silicon, Oxygen and Nitrogen Upon the Properties of Plasma Deposited Amorphous Diamond-like Carbon Coatings     Goto   Sponge   NotDistinct   Permalink

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Description
  • Amorphous diamond-like carbon films (DLC) with various silicon, oxygen and nitrogen content were deposited by plasma enhanced chemical vapor deposition (PECVD) technique. The films were prepared from the mixture of methane and hexamethyldisiloxane (HMDSO) in r.f. capacitively coupled discharges (13.56 MHz). The reactive plasma was investigated by optical emission spectroscopy and capacitive coupled planar probe. A combination of RBS, ERDA, FTIR and XPS methods was used to study the films' chemical composition and structure. The mechanical properties were studied using a depth sensing indentation technique. The films were mainly composed of C-C, C-H and C-Si bonds. The optimum deposition conditions for the preparation of DLC films, with enhanced thermo-mechanical stability, were determined.
  • Amorphous diamond-like carbon films (DLC) with various silicon, oxygen and nitrogen content were deposited by plasma enhanced chemical vapor deposition (PECVD) technique. The films were prepared from the mixture of methane and hexamethyldisiloxane (HMDSO) in r.f. capacitively coupled discharges (13.56 MHz). The reactive plasma was investigated by optical emission spectroscopy and capacitive coupled planar probe. A combination of RBS, ERDA, FTIR and XPS methods was used to study the films' chemical composition and structure. The mechanical properties were studied using a depth sensing indentation technique. The films were mainly composed of C-C, C-H and C-Si bonds. The optimum deposition conditions for the preparation of DLC films, with enhanced thermo-mechanical stability, were determined. (en)
Title
  • Influence of Silicon, Oxygen and Nitrogen Upon the Properties of Plasma Deposited Amorphous Diamond-like Carbon Coatings
  • Influence of Silicon, Oxygen and Nitrogen Upon the Properties of Plasma Deposited Amorphous Diamond-like Carbon Coatings (en)
skos:prefLabel
  • Influence of Silicon, Oxygen and Nitrogen Upon the Properties of Plasma Deposited Amorphous Diamond-like Carbon Coatings
  • Influence of Silicon, Oxygen and Nitrogen Upon the Properties of Plasma Deposited Amorphous Diamond-like Carbon Coatings (en)
skos:notation
  • RIV/00216224:14310/06:00017368!RIV10-MSM-14310___
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • Z(AV0Z10480505), Z(AV0Z20410507), Z(MSM0021622411)
http://linked.open...iv/cisloPeriodika
  • 2
http://linked.open...vai/riv/dodaniDat
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  • 479504
http://linked.open...ai/riv/idVysledku
  • RIV/00216224:14310/06:00017368
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • Silicon; Oxygen; Nitrogen; Admixtures; PECVD; Amorphous Diamond-like Carbon Coatings (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • CA - Kanada
http://linked.open...ontrolniKodProRIV
  • [E71B6D696D12]
http://linked.open...i/riv/nazevZdroje
  • Journal of advanced oxidation technologies
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
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http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 9
http://linked.open...iv/tvurceVysledku
  • Buršík, Jiří
  • Buršíková, Vilma
  • Dvořák, Pavel
  • Janča, Jan
  • Valtr, Miroslav
  • Zajíčková, Lenka
  • Bláhová, Olga
  • Peřina, Vratislav
http://linked.open...ain/vavai/riv/wos
  • 000239478600023
http://linked.open...n/vavai/riv/zamer
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  • 1203-8407
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  • 14310
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