About: Deposition Process Based on Organosilicon Precursors in Dielectric Barrier Discharges at Atmospheric Pressure

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An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

Attributes	Values
rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Deposition Process Based on Organosilicon Precursors in Dielectric Barrier Discharges at Atmospheric Pressure - A Comparison Deposition Process Based on Organosilicon Precursors in Dielectric Barrier Discharges at Atmospheric Pressure - A Comparison (en)
Title	Deposition Process Based on Organosilicon Precursors in Dielectric Barrier Discharges at Atmospheric Pressure - A Comparison Deposition Process Based on Organosilicon Precursors in Dielectric Barrier Discharges at Atmospheric Pressure - A Comparison (en)
skos:prefLabel	Deposition Process Based on Organosilicon Precursors in Dielectric Barrier Discharges at Atmospheric Pressure - A Comparison Deposition Process Based on Organosilicon Precursors in Dielectric Barrier Discharges at Atmospheric Pressure - A Comparison (en)
skos:notation	RIV/00216224:14310/01:00005627!RIV/2002/GA0/143102/N
http://linked.open.../vavai/riv/strany	266
http://linked.open...avai/riv/aktivita	P
http://linked.open...avai/riv/aktivity	P(GA202/00/P037)
http://linked.open...iv/cisloPeriodika	4
http://linked.open...vai/riv/dodaniDat	2002
http://linked.open...aciTvurceVysledku	Zajíčková, Lenka
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Masarykova univerzita / Přírodovědecká fakulta
http://linked.open...dnocenehoVysledku	677155
http://linked.open...ai/riv/idVysledku	RIV/00216224:14310/01:00005627
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	Deposition Process Based on Organosilicon Precursors in Dielectric Barrier Discharges at Atmospheric Pressure - A Comparison (en)
http://linked.open.../riv/klicoveSlovo	Deposition Process Based on Organosilicon Precursors in Dielectric Barrier Discharges at Atmospheric Pressure - A Comparison
http://linked.open...odStatuVydavatele	US - Spojené státy americké
http://linked.open...ontrolniKodProRIV	[08498292B1E0]
http://linked.open...i/riv/nazevZdroje	Plasmas and Polymers
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	1 (xsd:int)
http://linked.open...cetTvurcuVysledku	7 (xsd:int)
http://linked.open...ocetUcastnikuAkce	0 (xsd:int)
http://linked.open...nichUcastnikuAkce	0 (xsd:int)
http://linked.open...vavai/riv/projekt	Plasma deposition of protective coatings: characterisation of prepared films and diagnostics of reactive plasmas used
http://linked.open...UplatneniVysledku	2001
http://linked.open...v/svazekPeriodika	6
http://linked.open...iv/tvurceVysledku	Zajíčková, Lenka Hippler, R. Behnke, J. F. Sonnenfeld, Axel Tun, T. M. Kozlov, K. V. Wagner, H.-E.
issn	1084-0184
number of pages	30 (xsd:int)
http://localhost/t...ganizacniJednotka	14310

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