Attributes | Values |
---|
rdf:type
| |
Description
| - High frequency plasma pencil is a source of highly active environment which can be generated at atmospheric, reduced or increased perssure. The discharge can be unipolar or bipolar.The plasma pensil discharge is studied by optical emission spectroscopy. Several technological aapplications like restation of archeological glass and metal artifacts, fragmentation of molecules for microelectrophoresis and plasma polymerization are summarized.
- High frequency plasma pencil is a source of highly active environment which can be generated at atmospheric, reduced or increased perssure. The discharge can be unipolar or bipolar.The plasma pensil discharge is studied by optical emission spectroscopy. Several technological aapplications like restation of archeological glass and metal artifacts, fragmentation of molecules for microelectrophoresis and plasma polymerization are summarized. (en)
- High frequency plasma pencil is a source of highly active environment which can be generated at atmospheric, reduced or increased perssure. The discharge can be unipolar or bipolar.The plasma pensil discharge is studied by optical emission spectroscopy. Several technological aapplications like restation of archeological glass and metal artifacts, fragmentation of molecules for microelectrophoresis and plasma polymerization are summarized. (cs)
|
Title
| - Diagnostics and Applications of High Frequency Plasma Pencil
- Diagnostics and Applications of High Frequency Plasma Pencil (en)
- Diagnostics and Application of High Frequency Plasma Pencil (cs)
|
skos:prefLabel
| - Diagnostics and Applications of High Frequency Plasma Pencil
- Diagnostics and Applications of High Frequency Plasma Pencil (en)
- Diagnostics and Application of High Frequency Plasma Pencil (cs)
|
skos:notation
| - RIV/00216224:14310/01:00005318!RIV08-MSM-14310___
|
http://linked.open.../vavai/riv/strany
| |
http://linked.open...avai/riv/aktivita
| |
http://linked.open...avai/riv/aktivity
| - P(ME 301), P(OC 527.20), Z(MSM 143100003)
|
http://linked.open...iv/cisloPeriodika
| |
http://linked.open...vai/riv/dodaniDat
| |
http://linked.open...aciTvurceVysledku
| |
http://linked.open.../riv/druhVysledku
| |
http://linked.open...iv/duvernostUdaju
| |
http://linked.open...titaPredkladatele
| |
http://linked.open...dnocenehoVysledku
| |
http://linked.open...ai/riv/idVysledku
| - RIV/00216224:14310/01:00005318
|
http://linked.open...riv/jazykVysledku
| |
http://linked.open.../riv/klicovaSlova
| - High frequency discharge; plasma sources; plasma teratment; plasma-liquid technologies (en)
|
http://linked.open.../riv/klicoveSlovo
| |
http://linked.open...odStatuVydavatele
| - GB - Spojené království Velké Británie a Severního Irska
|
http://linked.open...ontrolniKodProRIV
| |
http://linked.open...i/riv/nazevZdroje
| - Plasma Chemistry and Plasma Processing
|
http://linked.open...in/vavai/riv/obor
| |
http://linked.open...ichTvurcuVysledku
| |
http://linked.open...cetTvurcuVysledku
| |
http://linked.open...vavai/riv/projekt
| |
http://linked.open...UplatneniVysledku
| |
http://linked.open...v/svazekPeriodika
| |
http://linked.open...iv/tvurceVysledku
| - Janča, Jan
- Klíma, Miloš
- Slavíček, Pavel
- Zajíčková, Lenka
|
http://linked.open...n/vavai/riv/zamer
| |
issn
| |
number of pages
| |
http://localhost/t...ganizacniJednotka
| |