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  • High frequency plasma pencil is a source of highly active environment which can be generated at atmospheric, reduced or increased perssure. The discharge can be unipolar or bipolar.The plasma pensil discharge is studied by optical emission spectroscopy. Several technological aapplications like restation of archeological glass and metal artifacts, fragmentation of molecules for microelectrophoresis and plasma polymerization are summarized.
  • High frequency plasma pencil is a source of highly active environment which can be generated at atmospheric, reduced or increased perssure. The discharge can be unipolar or bipolar.The plasma pensil discharge is studied by optical emission spectroscopy. Several technological aapplications like restation of archeological glass and metal artifacts, fragmentation of molecules for microelectrophoresis and plasma polymerization are summarized. (en)
  • High frequency plasma pencil is a source of highly active environment which can be generated at atmospheric, reduced or increased perssure. The discharge can be unipolar or bipolar.The plasma pensil discharge is studied by optical emission spectroscopy. Several technological aapplications like restation of archeological glass and metal artifacts, fragmentation of molecules for microelectrophoresis and plasma polymerization are summarized. (cs)
Title
  • Diagnostics and Applications of High Frequency Plasma Pencil
  • Diagnostics and Applications of High Frequency Plasma Pencil (en)
  • Diagnostics and Application of High Frequency Plasma Pencil (cs)
skos:prefLabel
  • Diagnostics and Applications of High Frequency Plasma Pencil
  • Diagnostics and Applications of High Frequency Plasma Pencil (en)
  • Diagnostics and Application of High Frequency Plasma Pencil (cs)
skos:notation
  • RIV/00216224:14310/01:00005318!RIV08-MSM-14310___
http://linked.open.../vavai/riv/strany
  • 565
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(ME 301), P(OC 527.20), Z(MSM 143100003)
http://linked.open...iv/cisloPeriodika
  • 4
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 677602
http://linked.open...ai/riv/idVysledku
  • RIV/00216224:14310/01:00005318
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • High frequency discharge; plasma sources; plasma teratment; plasma-liquid technologies (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • GB - Spojené království Velké Británie a Severního Irska
http://linked.open...ontrolniKodProRIV
  • [0280DAA48123]
http://linked.open...i/riv/nazevZdroje
  • Plasma Chemistry and Plasma Processing
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 21 (2001)
http://linked.open...iv/tvurceVysledku
  • Janča, Jan
  • Klíma, Miloš
  • Slavíček, Pavel
  • Zajíčková, Lenka
http://linked.open...n/vavai/riv/zamer
issn
  • 0272-4324
number of pages
http://localhost/t...ganizacniJednotka
  • 14310
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