About: Plasma Enhanced CVD of DLC:Si(O) Films from Methane/Hexamethyldisiloxane Feeds

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Low pressure deposition of hard carbon films with addition of silicon and oxide was carried out in the mixture of methane and hexamethyldisiloxane (HMDSO). Film properties like deposition rate, hardness and optical constants depended strongly on tbe HMDSO to methane ratio. Moreover, the self bias voltage at the powered electrode, on which the substrates were placed, depended on this ratio too. Therefore, the plasma parameters were studied by OES and capacitavely coupled planar ion flux probe. It was found, that the temperatures as well as positive ion current density depended on the HMDSO to methane flow rate ratio but not on the self bias voltage that was independently changed with an external dc voltage supply. Low pressure deposition of hard carbon films with addition of silicon and oxide was carried out in the mixture of methane and hexamethyldisiloxane (HMDSO). Film properties like deposition rate, hardness and optical constants depended strongly on tbe HMDSO to methane ratio. Moreover, the self bias voltage at the powered electrode, on which the substrates were placed, depended on this ratio too. Therefore, the plasma parameters were studied by OES and capacitavely coupled planar ion flux probe. It was found, that the temperatures as well as positive ion current density depended on the HMDSO to methane flow rate ratio but not on the self bias voltage that was independently changed with an external dc voltage supply. (en) Low pressure deposition of hard carbon films with addition of silicon and oxide was carried out in the mixture of methane and hexamethyldisiloxane (HMDSO). Film properties like deposition rate, hardness and optical constants depended strongly on tbe HMDSO to methane ratio. Moreover, the self bias voltage at the powered electrode, on which the substrates were placed, depended on this ratio too. Therefore, the plasma parameters were studied by OES and capacitavely coupled planar ion flux probe. It was found, that the temperatures as well as positive ion current density depended on the HMDSO to methane flow rate ratio but not on the self bias voltage that was independently changed with an external dc voltage supply. (cs)
Title	Plasma Enhanced CVD of DLC:Si(O) Films from Methane/Hexamethyldisiloxane Feeds Plasma Enhanced CVD of DLC:Si(O) Films from Methane/Hexamethyldisiloxane Feeds (en) Plasma Enhanced CVD of DLC:Si(O) Films from Methane/Hexamethyldisiloxane Feeds (cs)
skos:prefLabel	Plasma Enhanced CVD of DLC:Si(O) Films from Methane/Hexamethyldisiloxane Feeds Plasma Enhanced CVD of DLC:Si(O) Films from Methane/Hexamethyldisiloxane Feeds (en) Plasma Enhanced CVD of DLC:Si(O) Films from Methane/Hexamethyldisiloxane Feeds (cs)
skos:notation	RIV/00216224:14310/01:00004510!RIV08-MSM-14310___
http://linked.open.../vavai/riv/strany	133
http://linked.open...avai/riv/aktivita	P Z
http://linked.open...avai/riv/aktivity	P(GA202/00/P037), P(ME 301), P(ME 367), P(OC 527.20), Z(MSM 143100003)
http://linked.open...vai/riv/dodaniDat	2008
http://linked.open...aciTvurceVysledku	Janča, Jan Navrátil, Vladislav Peřina, Vratislav Macková, Anna Zajíčková, Lenka Buršíková, Vilma Dvořák, Pavel
http://linked.open.../riv/druhVysledku	D - Článek ve sborníku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Masarykova univerzita / Přírodovědecká fakulta
http://linked.open...dnocenehoVysledku	691251
http://linked.open...ai/riv/idVysledku	RIV/00216224:14310/01:00004510
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	PECVD; Diamod-like carbon; Hardness; Optical emission spectroscopy; ion density (en)
http://linked.open.../riv/klicoveSlovo	PECVD Optical emission spectroscopy ion density Hardness Diamod-like carbon
http://linked.open...ontrolniKodProRIV	[40F7CD638762]
http://linked.open...v/mistoKonaniAkce	9. - 13. 7. 2001, Orleans (France)
http://linked.open...i/riv/mistoVydani	Orleans (France)
http://linked.open...i/riv/nazevZdroje	Proceedings of 15th International Symposium on Plasma Chemistry
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	7 (xsd:int)
http://linked.open...cetTvurcuVysledku	7 (xsd:int)
http://linked.open...vavai/riv/projekt	http://linked.opendata.cz/resource/domain/vavai/projekt/ME%20367 http://linked.opendata.cz/resource/domain/vavai/projekt/ME%20301 Plasma deposition of protective coatings: characterisation of prepared films and diagnostics of reactive plasmas used http://linked.opendata.cz/resource/domain/vavai/projekt/OC%20527.20
http://linked.open...UplatneniVysledku	2001
http://linked.open...iv/tvurceVysledku	Buršíková, Vilma Dvořák, Pavel Janča, Jan Macková, Anna Zajíčková, Lenka Peřina, Vratislav Navrátil, Vladislav
http://linked.open...vavai/riv/typAkce	CST - Celostátní
http://linked.open.../riv/zahajeniAkce	2001-01-01 (xsd:date)
http://linked.open...n/vavai/riv/zamer	http://linked.opendata.cz/resource/domain/vavai/zamer/MSM%20143100003
number of pages	6 (xsd:int)
http://purl.org/ne...btex#hasPublisher	GREMI, CNRS/University of Orleans
http://localhost/t...ganizacniJednotka	14310

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