About: The effect of the substrate on thermal stability of CeOx and Rh-Ce-O thin films

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About: The effect of the substrate on thermal stability of CeOx and Rh-Ce-O thin films Goto Sponge NotDistinct Permalink

An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

Attributes	Values
rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
rdfs:seeAlso	http://dx.doi.org/10.1002/sia.5503
Description	Cerium oxide doped by a noble metal has been researched intensively for its high catalytic activity. In the presented study, Rh-Ce-O and CeOx thin films were deposited onto SiO2 and Cu substrates by radio-frequency magnetron sputtering. Thermal stability of the films was investigated by photoelectron spectroscopy techniques. Our results show that the substrate has a great influence on the stability of the overlayers. Rh-Ce-O deposited on Cu decomposes into rhodium and cerium oxide separate phases above 600 K. In contrary, the Rh-Ce-O film on SiO2 remains stable up to 800 K, but silicon migrates from the substrate into the film, forming cerium silicate. We suggest that a strong interaction between SiO2 substrate and Rh-Ce-O, or CeOx films, could be responsible for higher thermal stability compared to films deposited onto Cu. Cerium oxide doped by a noble metal has been researched intensively for its high catalytic activity. In the presented study, Rh-Ce-O and CeOx thin films were deposited onto SiO2 and Cu substrates by radio-frequency magnetron sputtering. Thermal stability of the films was investigated by photoelectron spectroscopy techniques. Our results show that the substrate has a great influence on the stability of the overlayers. Rh-Ce-O deposited on Cu decomposes into rhodium and cerium oxide separate phases above 600 K. In contrary, the Rh-Ce-O film on SiO2 remains stable up to 800 K, but silicon migrates from the substrate into the film, forming cerium silicate. We suggest that a strong interaction between SiO2 substrate and Rh-Ce-O, or CeOx films, could be responsible for higher thermal stability compared to films deposited onto Cu. (en)
Title	The effect of the substrate on thermal stability of CeOx and Rh-Ce-O thin films The effect of the substrate on thermal stability of CeOx and Rh-Ce-O thin films (en)
skos:prefLabel	The effect of the substrate on thermal stability of CeOx and Rh-Ce-O thin films The effect of the substrate on thermal stability of CeOx and Rh-Ce-O thin films (en)
skos:notation	RIV/00216208:11320/14:10289725!RIV15-MSM-11320___
http://linked.open...avai/riv/aktivita	I P S
http://linked.open...avai/riv/aktivity	I, P(LD13054), P(LG12003), S
http://linked.open...iv/cisloPeriodika	10-11
http://linked.open...vai/riv/dodaniDat	2015
http://linked.open...aciTvurceVysledku	Ševčíková, Klára Zahoranová, Tatiana Tsud, Nataliya Matolín, Vladimír Nehasil, Václav Vorokhta, Mykhailo
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Univerzita Karlova v Praze / Matematicko-fyzikální fakulta
http://linked.open...dnocenehoVysledku	13566
http://linked.open...ai/riv/idVysledku	RIV/00216208:11320/14:10289725
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	cerium silicate; thin film; mixed oxide; rhodium; ceria; photoelectron spectroscopy (en)
http://linked.open.../riv/klicoveSlovo	cerium silicate rhodium mixed oxide photoelectron spectroscopy ceria thin film
http://linked.open...odStatuVydavatele	GB - Spojené království Velké Británie a Severního Irska
http://linked.open...ontrolniKodProRIV	[2E63FC8CAE76]
http://linked.open...i/riv/nazevZdroje	Surface and Interface Analysis
http://linked.open...in/vavai/riv/obor	BM
http://linked.open...ichTvurcuVysledku	6 (xsd:int)
http://linked.open...cetTvurcuVysledku	9 (xsd:int)
http://linked.open...vavai/riv/projekt	Materials science beamline at synchrotron Elettra in Trieste Cerium Oxide Based Fuel Cell Thin Film Catalysts
http://linked.open...UplatneniVysledku	2014
http://linked.open...v/svazekPeriodika	46
http://linked.open...iv/tvurceVysledku	Matolín, Vladimír Tsud, Nataliya Vorokhta, Mykhailo Nehasil, Václav Kobayashi, Keisuke Kobata, Masaaki Ševčíková, Klára Yoshikawa, Hideki Zahoranová, Tatiana
http://linked.open...ain/vavai/riv/wos	000344987400068
issn	0142-2421
number of pages	4 (xsd:int)
http://bibframe.org/vocab/doi	10.1002/sia.5503
http://localhost/t...ganizacniJednotka	11320

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