About: HAXPES study of CeOx thin film-silicon oxide interface

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An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

Attributes	Values
rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
rdfs:seeAlso	http://dx.doi.org/10.1016/j.apsusc.2014.02.048
Description	Investigation of cerium oxide thin film deposition on silicon and silicon oxide is important due to many possible applications of cerium oxide based micro-systems in electronics and catalysis. rf-Magnetron sputtering is technologically the most suitable method of preparation of such systems. Mechanism of film growth is strongly influenced by interaction of Ce atoms with the substrate and their oxidation by oxygen containing rf plasma. We show using hard X-ray photoelectron spectroscopy with high information depth that cerium is reducing silicon oxide by forming complex silicate phase at the interface with Ce in the 3+ state. For this reason composition of very thin films of cerium oxide is strongly influenced by thin film-substrate interaction. A coating of the silicon oxide substrate by an intermediate thin carbon film provides conductive substrate for electrocatalytic applications and decreases the silicon oxide substrates-cerium oxide interaction essentially. (C) 2014 Elsevier B.V. All rights reserved. Investigation of cerium oxide thin film deposition on silicon and silicon oxide is important due to many possible applications of cerium oxide based micro-systems in electronics and catalysis. rf-Magnetron sputtering is technologically the most suitable method of preparation of such systems. Mechanism of film growth is strongly influenced by interaction of Ce atoms with the substrate and their oxidation by oxygen containing rf plasma. We show using hard X-ray photoelectron spectroscopy with high information depth that cerium is reducing silicon oxide by forming complex silicate phase at the interface with Ce in the 3+ state. For this reason composition of very thin films of cerium oxide is strongly influenced by thin film-substrate interaction. A coating of the silicon oxide substrate by an intermediate thin carbon film provides conductive substrate for electrocatalytic applications and decreases the silicon oxide substrates-cerium oxide interaction essentially. (C) 2014 Elsevier B.V. All rights reserved. (en)
Title	HAXPES study of CeOx thin film-silicon oxide interface HAXPES study of CeOx thin film-silicon oxide interface (en)
skos:prefLabel	HAXPES study of CeOx thin film-silicon oxide interface HAXPES study of CeOx thin film-silicon oxide interface (en)
skos:notation	RIV/00216208:11320/14:10288967!RIV15-MSM-11320___
http://linked.open...avai/riv/aktivita	I P S
http://linked.open...avai/riv/aktivity	I, P(GA13-10396S), P(LD11047), S
http://linked.open...iv/cisloPeriodika	červen
http://linked.open...vai/riv/dodaniDat	2015
http://linked.open...aciTvurceVysledku	Ševčíková, Klára Matolínová, Iva Matolín, Vladimír Khalakhan, Ivan Haviar, Stanislav Vorokhta, Mykhailo Dubau, Martin
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Univerzita Karlova v Praze / Matematicko-fyzikální fakulta
http://linked.open...dnocenehoVysledku	18813
http://linked.open...ai/riv/idVysledku	RIV/00216208:11320/14:10288967
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	Catalysis; Silicon; Cerium oxide; Photoelectron spectroscopy (en)
http://linked.open.../riv/klicoveSlovo	Silicon Cerium oxide Photoelectron spectroscopy Catalysis
http://linked.open...odStatuVydavatele	NL - Nizozemsko
http://linked.open...ontrolniKodProRIV	[42D4694D395F]
http://linked.open...i/riv/nazevZdroje	Applied Surface Science
http://linked.open...in/vavai/riv/obor	BM
http://linked.open...ichTvurcuVysledku	7 (xsd:int)
http://linked.open...cetTvurcuVysledku	9 (xsd:int)
http://linked.open...vavai/riv/projekt	New materials for planar fuel cells Model Systems of Nanostructured Bimetallic Materials for Enviromental Applications
http://linked.open...UplatneniVysledku	2014
http://linked.open...v/svazekPeriodika	303
http://linked.open...iv/tvurceVysledku	Matolín, Vladimír Matolínová, Iva Mori, T. Yoshikawa, H. Vorokhta, Mykhailo Khalakhan, Ivan Haviar, Stanislav Ševčíková, Klára Dubau, Martin
http://linked.open...ain/vavai/riv/wos	000334293200007
issn	0169-4332
number of pages	8 (xsd:int)
http://bibframe.org/vocab/doi	10.1016/j.apsusc.2014.02.048
http://localhost/t...ganizacniJednotka	11320

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