About: Preparation of Magnetron Sputtered Thin Cerium Oxide Films with a Large Surface on Silicon Substrates Using Carbonaceous Interlayers

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About: Preparation of Magnetron Sputtered Thin Cerium Oxide Films with a Large Surface on Silicon Substrates Using Carbonaceous Interlayers Goto Sponge NotDistinct Permalink

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
rdfs:seeAlso	http://dx.doi.org/10.1021/am4049546
Description	The study focuses on preparation of thin cerium oxide films with a porous structure prepared by rf magnetron sputtering on a silicon wafer substrate using amorphous carbon (a-C) and nitrogenated amorphous carbon films (CNx) as an interlayer. We show that the structure and morphology of the deposited layers depend on the oxygen concentration in working gas used for cerium oxide deposition. Considerable erosion of the carbonaceous interlayer accompanied by the formation of highly porous carbon/cerium oxide bilayer systems is reported. Etching of the carbon interlayer with oxygen species occurring simultaneously with cerium oxide film growth is considered to be the driving force for this effect resulting in the formation of nanostructured cerium oxide films with large surface. In this regard, results of oxygen plasma treatment of a-C and CNx, films are presented. Gradual material erosion with increasing duration of plasma impact accompanied by modification of the surface roughness is reported for both types of films. The CNx films were found to be much less resistant to oxygen etching than the a-C film. The study focuses on preparation of thin cerium oxide films with a porous structure prepared by rf magnetron sputtering on a silicon wafer substrate using amorphous carbon (a-C) and nitrogenated amorphous carbon films (CNx) as an interlayer. We show that the structure and morphology of the deposited layers depend on the oxygen concentration in working gas used for cerium oxide deposition. Considerable erosion of the carbonaceous interlayer accompanied by the formation of highly porous carbon/cerium oxide bilayer systems is reported. Etching of the carbon interlayer with oxygen species occurring simultaneously with cerium oxide film growth is considered to be the driving force for this effect resulting in the formation of nanostructured cerium oxide films with large surface. In this regard, results of oxygen plasma treatment of a-C and CNx, films are presented. Gradual material erosion with increasing duration of plasma impact accompanied by modification of the surface roughness is reported for both types of films. The CNx films were found to be much less resistant to oxygen etching than the a-C film. (en)
Title	Preparation of Magnetron Sputtered Thin Cerium Oxide Films with a Large Surface on Silicon Substrates Using Carbonaceous Interlayers Preparation of Magnetron Sputtered Thin Cerium Oxide Films with a Large Surface on Silicon Substrates Using Carbonaceous Interlayers (en)
skos:prefLabel	Preparation of Magnetron Sputtered Thin Cerium Oxide Films with a Large Surface on Silicon Substrates Using Carbonaceous Interlayers Preparation of Magnetron Sputtered Thin Cerium Oxide Films with a Large Surface on Silicon Substrates Using Carbonaceous Interlayers (en)
skos:notation	RIV/00216208:11320/14:10288012!RIV15-GA0-11320___
http://linked.open...avai/riv/aktivita	P S
http://linked.open...avai/riv/aktivity	P(GA13-10396S), S
http://linked.open...iv/cisloPeriodika	2
http://linked.open...vai/riv/dodaniDat	2015
http://linked.open...aciTvurceVysledku	Matolínová, Iva Matolín, Vladimír Khalakhan, Ivan Haviar, Stanislav Lavková, Jaroslava Dubau, Martin
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Univerzita Karlova v Praze / Matematicko-fyzikální fakulta
http://linked.open...dnocenehoVysledku	39041
http://linked.open...ai/riv/idVysledku	RIV/00216208:11320/14:10288012
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	atomic force microscopy; electron microscopy; porous structure; oxygen plasma; magnetron sputtering; cerium oxide thin film (en)
http://linked.open.../riv/klicoveSlovo	electron microscopy magnetron sputtering oxygen plasma porous structure atomic force microscopy cerium oxide thin film
http://linked.open...odStatuVydavatele	US - Spojené státy americké
http://linked.open...ontrolniKodProRIV	[BB9ADF3445EB]
http://linked.open...i/riv/nazevZdroje	ACS applied materials & interfaces
http://linked.open...in/vavai/riv/obor	BM
http://linked.open...ichTvurcuVysledku	6 (xsd:int)
http://linked.open...cetTvurcuVysledku	7 (xsd:int)
http://linked.open...vavai/riv/projekt	New materials for planar fuel cells
http://linked.open...UplatneniVysledku	2014
http://linked.open...v/svazekPeriodika	6
http://linked.open...iv/tvurceVysledku	Matolín, Vladimír Matolínová, Iva Khalakhan, Ivan Haviar, Stanislav Lavková, Jaroslava Potin, Valerie Dubau, Martin
http://linked.open...ain/vavai/riv/wos	000330201900065
issn	1944-8244
number of pages	6 (xsd:int)
http://bibframe.org/vocab/doi	10.1021/am4049546
http://localhost/t...ganizacniJednotka	11320

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