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  • R. f. magnetron sputtering of poly(tetrafluoroethylene) in configuration of a gas aggregation source is shown to produce super-hydrophobic nano-structured coatings in which cross-linked nano-particles of fluorocarbon plasma polymer are embedded in an uncross-linked continuous (-CF2-)(x), matrix. The 20-30 nm nano-particles appear in proximity of the magnetron and have cross-linked structure as a result of fast random radical recombination in the plasma. The continuous phase is formed at remote distances from the magnetron as a result of slower step-growth gas phase polymerization of CF2 bi-radicals. The matrix has highly crystalline structure in which the CF2 groups tend to adopt a 15/7 helical configuration. At least part of the macromolecules constituting the polymeric phase are oligomers with the molar mass below 1400 g/mol.
  • R. f. magnetron sputtering of poly(tetrafluoroethylene) in configuration of a gas aggregation source is shown to produce super-hydrophobic nano-structured coatings in which cross-linked nano-particles of fluorocarbon plasma polymer are embedded in an uncross-linked continuous (-CF2-)(x), matrix. The 20-30 nm nano-particles appear in proximity of the magnetron and have cross-linked structure as a result of fast random radical recombination in the plasma. The continuous phase is formed at remote distances from the magnetron as a result of slower step-growth gas phase polymerization of CF2 bi-radicals. The matrix has highly crystalline structure in which the CF2 groups tend to adopt a 15/7 helical configuration. At least part of the macromolecules constituting the polymeric phase are oligomers with the molar mass below 1400 g/mol. (en)
Title
  • Poly(tetrafluoroethylene) sputtering in a gas aggregation source for fabrication of nano-structured deposits
  • Poly(tetrafluoroethylene) sputtering in a gas aggregation source for fabrication of nano-structured deposits (en)
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  • Poly(tetrafluoroethylene) sputtering in a gas aggregation source for fabrication of nano-structured deposits
  • Poly(tetrafluoroethylene) sputtering in a gas aggregation source for fabrication of nano-structured deposits (en)
skos:notation
  • RIV/00216208:11320/14:10282218!RIV15-MSM-11320___
http://linked.open...avai/riv/aktivita
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  • P(GA13-09853S), S
http://linked.open...iv/cisloPeriodika
  • September
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  • 37464
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  • RIV/00216208:11320/14:10282218
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  • Poly(tetrafluoroethylene); Plasma polymer; Nano-particles; Magnetron sputtering; Gas aggregation source (en)
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  • CH - Švýcarská konfederace
http://linked.open...ontrolniKodProRIV
  • [1847F8690B62]
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  • Surface and Coatings Technology
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  • 254
http://linked.open...iv/tvurceVysledku
  • Hanuš, Jan
  • Kylián, Ondřej
  • Biederman, Hynek
  • Drábik, Martin
  • Kousal, Jaroslav
  • Shukurov, Andrey
  • Slavínská, Danka
  • Serov, Anton
  • Kuzminova, Anna
  • Shelemin, Artem
  • Melnichuk, Iurii
http://linked.open...ain/vavai/riv/wos
  • 000340977300041
issn
  • 0257-8972
number of pages
http://bibframe.org/vocab/doi
  • 10.1016/j.surfcoat.2014.06.014
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  • 11320
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